EFFECTS OF Cl- CONCENTRATION AND TEMPERATURE ON THE CORROSION BEHAVIOR OF ALLOY 690 IN BORATE BUFFER SOLUTION
HUANG Fa, WANG Jianqiu, HAN En-Hou, KE Wei
State Key Laboratory for Corrosion and Protection, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016
Cite this article:
HUANG Fa WANG Jianqiu HAN En-Hou KE Wei. EFFECTS OF Cl- CONCENTRATION AND TEMPERATURE ON THE CORROSION BEHAVIOR OF ALLOY 690 IN BORATE BUFFER SOLUTION. Acta Metall Sin, 2011, 47(7): 809-815.
Abstract The effects of Cl$^{-}$ concentration (0.5-2 mol/L) and temperature (25-80 ℃) on the corrosion behavior of alloy 690 in borate buffer solution were investigated using potentiodynamic polarization (PD), electrochemical impedence spectroscopy (EIS) and semiconductor capacitance method (Mott-Scottky relation). Atomic force microscope (AFM), X-ray photoelectron spectroscopy (XPS) and potential--pH diagrams were employed to analyze the corrosion products. All of the polarization curves exhibited two passive regions and intergranular corrosion was observed on all samples. With the increase in both Cl- concentration and temperature, the corrosion potential decreased and the corrosion current density became larger. Furthermore, increasing the temperature also resulted in lower pitting potentials and narrower passive regions. After anodic polarization for 45 min, the film formed in the first passive region with lower potential was composed of Cr2O3, Fe2O3 and Ni(OH)2, and behaved like a mixed-type semiconductor, while a thicker but less compact Ni2O3 film was formed in the second passive range with higher potential and behaved like a n-type semiconductor. The influences of Cl- and temperature on the corrosion behavior were discussed.
[8] Carette F, Lafont M C, Chatainier G, Guinard L, Pieraggi B. Surf Interface Anal, 2002; 34: 135
[9] Panter J, Viguier B, Clou´e J M, Foucault M, Combrade P, Andrieu E. J Nucl Mater, 2006; 348: 213
[10] Machet A, Galtayries A, Zanna S, Klein L, Maurice V, Jolivet P, Foucault M, Combrade P, Scott P, Marcus P. Electrochim Acta, 2004; 49: 3957
[11] Lemire R J, McRae G A. J Nucl Mater, 2001; 294: 141
[12] Yang I J. Corros Sci, 1992; 33: 25
[13] Bosch R W, F´eron D, Celis J P. Electrochemistry in Light Water Reactors, Reference Electrodes, Measurement, Corrosion and Tribocorrosion Issues. Cambridge, Woodhead Publishing in Materials, 2007: 3
[14] Chen Y Y, Chou L B, Shih H C. Mater Sci Eng, 2005; A396: 129
[15] Belo M D C, Hakiki N E, Ferreira M G S. Electrochim Acta, 1999; 44: 2473
[16] Ries L A S, Belo M D C, Ferreira M G S, Muller I L. Corros Sci, 2008; 50: 676
[17] Sikora E, Macdonald D D. Electrochim Acta, 2002; 48: 69
[18] Macdonald D D, Scott A C, Wentrcek P. J Electrochem Soc, 1979; 126: 908
[19] Zhang J Q. Electrochemical Measurement Technology. Beijing: Chemical Industry Press, 2010: 231
(张鉴清. 电化学测试技术. 北京: 化学工业出版社, 2010: 231)
[20] Huang J B, Wu X Q, Han E H. Corros Sci, 2009; 51: 2976
[21] Mahfouz R, Aires F J Cadete Santos, Brenier A, Jacquier B, Bertolini J C. Appl Surf Sci, 2008; 254: 5181
[22] Biesinger MC, Brown C, Mycroft J R. Surf Interface Anal, 2004; 36: 1550
[23] Yamamura T, Okuyama N, Shiokaka Y, Oku M, Tomiyasu H, Tomiyasu H. J Electrochem Soc, 2005; 152: B540
[24] Chen C M, Aral K, Theus G J. Computer–Calculated Potential–pH Diagrams to 300 , EPRI–report NP–3137, Palo Alto, CA: Electric Power Research Institute, 1983
[25] Sato N, Kudo K. Electrochim Acta, 1974; 19: 461