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Acta Metall Sin  2016, Vol. 52 Issue (10): 1353-1362    DOI: 10.11900/0412.1961.2016.00392
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QUASICRYSTAL ABRASIVE POLISHING ON SOFT METALS VIA A CHARACTERISTIC SMEARING WEAR MECHANISM FOR EFFICIENT SURFACE FLATTENING, HARDENING AND CORROSION ENHANCEMENT
Yongjun CHEN1,Xiaogang HU1,Jianbing QIANG1,2,Chuang DONG1,2()
1 School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China
2 Key Lab of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian 116024, China
Cite this article: 

Yongjun CHEN, Xiaogang HU, Jianbing QIANG, Chuang DONG. QUASICRYSTAL ABRASIVE POLISHING ON SOFT METALS VIA A CHARACTERISTIC SMEARING WEAR MECHANISM FOR EFFICIENT SURFACE FLATTENING, HARDENING AND CORROSION ENHANCEMENT. Acta Metall Sin, 2016, 52(10): 1353-1362.

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Abstract  

Polishing soft metals using hard abrasives such as diamond, alumina, and silica can easily damage the worn surface by deep scratches and by large material removal due to cutting wear mechanism. An abrasive material with appropriate hardness, hardness/elasticity ratio, and low friction is then highly desirable, which would avoid intense abrasion while at the same time minimize scratching on soft metals. Quasicrystals are characterized by low friction and high hardness/elasticity ratio, making them potentially suitable for use as abrasives for soft metals. It has been pointed out by the authors that AlCuFe quasicrystal abrasive shows a particular smearing dominant wear mechanism and can be used as a special abrasive for flattening soft metals. In this work, the Al62Cu25.5Fe12.5 quasicrystal abrasive was chosen, to compare with conventional hard abrasives such as diamond, alumina and silica, to wear against copper, 2024 aluminum alloy and 304 stainless steel. The surface topography, nano-indentation hardness, smearing coefficient, mass loss and electrochemical impedance were measured and the results indicate that the surface flattening is influenced by the smearing coefficient, a parameter developed to assess the degree of smearing-type wearing. A larger smearing coefficient leads to a more flatten surface at the least expense of mass loss. It is specially noticed that the characteristic smearing mechanism of quasicrystal abrasive produces an obvious surface hardening effect, with the nano-hardness of 304 stainless steel being increased by about 0.3 GPa. The corrosion resistance of the Al alloy is also enhanced due to the formation of a thick and dense passive film.

Key words:  quasicrystal abrasive      soft metal      smearing wear      surface hardening      passive film     
Received:  30 August 2016     
ZTFLH:     
Fund: Supported by National Natural Science Foundation of China (No.51131002)

URL: 

https://www.ams.org.cn/EN/10.11900/0412.1961.2016.00392     OR     https://www.ams.org.cn/EN/Y2016/V52/I10/1353

Fig.1  SEM images of Al2O3 (a), quasicrystal (QC) (b), and SiO2 (c) abrasives
Fig.2  OM image of indentations on the surface of copper
Fig.3  OM images of indentation evolution on the surface of copper polished by diamond (a, c, e, g) and QC (b, d, f, h) abrasives with polishing time of 0 min (a, b), 3 min (c, d), 6 min (e, f) and 9 min (g, h)
Fig.4  Length changes of diagonal polished by diamond and QC abrasives as a function of polishing time t on copper
Fig.5  Smearing coefficients of polished by QC abrasive and the three conventional abrasives on the surface of copper, 2024 aluminum alloy and stainless steel
Fig.6  AFM surface topographies of copper workpeices polished by diamond (a), Al2O3 (b), QC (c) and SiO2 (d) abrasives
Fig.7  AFM surface topographies of 2024 aluminum alloy workpeices polished by diamond (a), Al2O3 (b), QC (c) and SiO2 (d) abrasives
Material Abrasive Ra / nm RPV / nm RMS / nm
Copper Diamond 136 735 160
Al2O3 56 333 66
QC 49 286 60
SiO2 56 303 68
2024 aluminum alloy Diamond 29 323 36
Al2O3 41 423 52
QC 26 236 32
SiO2 33 343 42
304 stainless steel Diamond 13 173 17
Al2O3 13 176 18
QC 7 67 8
SiO2 126 625 145
Table 1  Roughnesses derived from AFM (10 μm×10 μm) on the surface of copper, 2024 aluminum alloy and 304 stainless steel polished by four kinds of abrasives
Material Diamond Al2O3 QC SiO2
Copper 0.01 0.05~0.07 0.09~0.15 0.12
2024 aluminum alloy 0.02 0.08~0.11 0.15~0.25 0.19
304 stainless steel 0.02 0.10~0.14 0.19~0.32 0.25
Table 2  Relatively hardness between workpeices and abrasives[4,20-24]
Fig.8  Relationship between smearing coefficient and mass loss polished by QC and the conventional abrasives on the surfaces of copper, 2024 aluminum alloy and stainless steel
Fig.9  Nano-indentation hardnesses for the polished surface with different abrasives on copper, 2024 aluminum alloy and 304 stainless steel
Fig.10  Nyquist impedance plots (a) and Bode plots (b) of the oxide film on 2024 aluminum alloy polished by four kinds of abrasives in neutrally aerated 3.5%NaCl solution (Inset in Fig.10a show the equivalent circuit, Rs—solution resistance, Rf—protective passive film resistance, CPEf—film impedance of the constant phase element)
Abrasive Rs Rf CPEf χ2 /10-4
Ωcm2 Ωcm2 Yf / (10-3Ω-1cm-2sn) nf
Diamond 4.497 421 1.900 0.586 2.22
Al2O3 5.873 741 1.009 0.677 1.38
QC 4.619 1065 0.767 0.732 0.72
SiO2 3.752 736 0.876 0.732 1.83
Table 3  Equivalent circuit parameters obtained by fitting the experimental impedance results on the surface of 2024 aluminum alloy after polished by different abrasives in 3.5%NaCl solution
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