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| Interface roughening in Ni/Al nanomultilayers and resistivity |
| LIU Mingxia; ZHANG Jianmin; XU Kewei |
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Cite this article:
LIU Mingxia; ZHANG Jianmin; XU Kewei. Interface roughening in Ni/Al nanomultilayers and resistivity. Acta Metall Sin, 2008, 44(3): 357-360 .
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Abstract In addition to the resistivity (ρ) and the specular reflection coefficient (P), interface roughening of Ni/Al nanomultilayers deposited by magnetron sputtering as a function of the number of bilayers (n), Ni:Al modulated ratio (R) and modulated period (L) have been characterized by Fuchs-Sondheimer(FS)- Mayadas-Shatzkes (MS) model. The results show that resistivity of multilayers was independent of the number of bilayers. With decreasing of R and L, the resistivity increased and the specular reflection coefficient decreased. The observed scale dependence of the specular reflection coefficient reflected the size effect in the interface roughening of metal nanomultilayers. Due to the nonsymmetrical interdiffusion behavior, the mutual promotion effect in the interfaces only displayed at the lower R and smaller L. Once the length scale was upon a critical value, this effect turned to be weakened and the interfacial diffusion became invisible.
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Received: 05 July 2007
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