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Acta Metall Sin  1995, Vol. 31 Issue (21): 429-434    DOI:
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ON THE COMPOSITE AND INTRINSIC HARDNESS OF Ti(C, N) FILMS
XU Kewei; BAI Chendong; HE Jiawen (State Key; Laboratory for Mechanical Behaviour of Materials; Hi'an Jiaotong University;Xi'an 710049)(Manuscript received 1994-08-23; in revised form 1995-01-26)
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XU Kewei; BAI Chendong; HE Jiawen (State Key; Laboratory for Mechanical Behaviour of Materials; Hi'an Jiaotong University;Xi'an 710049)(Manuscript received 1994-08-23; in revised form 1995-01-26). ON THE COMPOSITE AND INTRINSIC HARDNESS OF Ti(C, N) FILMS. Acta Metall Sin, 1995, 31(21): 429-434.

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Abstract  The model proposed by Joensson and Hogmark takes the parameter, C, as a constant for different film-substrate systems. The parameter was modified in the present paper according to different hardness ratio of film to substrate and used them to study the variation of the hardness of PCVD Ti(C, N) films with the composition and the microstructure.Comparing with bulk materials, Ti(C, N) films have a relative high hardness due to the smaller crystal size and the higher compressive residual stress. It is controlled by the carbon content and hold a linear increase with the carbon content for a definite deposition technique.Correspondent:(XU Kewei, professor, Hi'an Jiaotong University, Hi'an 710049)
Key words:  Ti(C      N) film      composite hardness      intrinsic hardness     
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