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Acta Metall Sin  1990, Vol. 26 Issue (4): 139-143    DOI:
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NETWORK FRACTAL AND ANNEALING-INDUCED AGGREGATION OF Cu/a-C:H BILAYER FILMS
ZHANG Renji;WANG Wangdi;HE Daren Tsinghua University Northwest University; Xi'an Department of Mechanical Engineering;Tsinghua University;Beijing 100084
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ZHANG Renji;WANG Wangdi;HE Daren Tsinghua University Northwest University; Xi'an Department of Mechanical Engineering;Tsinghua University;Beijing 100084. NETWORK FRACTAL AND ANNEALING-INDUCED AGGREGATION OF Cu/a-C:H BILAYER FILMS. Acta Metall Sin, 1990, 26(4): 139-143.

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Abstract  The Cu/a--C:H blayer films, grown far from the equilibrium, havethe network fractal structure. Their fractal dimension value D_f=1 .83. An in situdynamic observation of these films under TEM with slowly heating revealed that theinitial network fractal structure was damaged gradually and broken down completelyat 535℃. And as the annealing-induced aggregation developed, the random spreadaggregated gradually, the fractal dimension of the new structure decreased with theincreasing of annealing temperature. Finally, the D_f=1.63 at 850℃. Based on thesurface and interface diffusion model of the metallic atoms, the variation of thestructural character could be explained.
Key words:  Cu film      fractal      annealing-induced aggregation     
Received:  18 April 1990     
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