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NETWORK FRACTAL AND ANNEALING-INDUCED AGGREGATION OF Cu/a-C:H BILAYER FILMS |
ZHANG Renji;WANG Wangdi;HE Daren Tsinghua University Northwest University; Xi'an Department of Mechanical Engineering;Tsinghua University;Beijing 100084 |
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Cite this article:
ZHANG Renji;WANG Wangdi;HE Daren Tsinghua University Northwest University; Xi'an Department of Mechanical Engineering;Tsinghua University;Beijing 100084. NETWORK FRACTAL AND ANNEALING-INDUCED AGGREGATION OF Cu/a-C:H BILAYER FILMS. Acta Metall Sin, 1990, 26(4): 139-143.
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Abstract The Cu/a--C:H blayer films, grown far from the equilibrium, havethe network fractal structure. Their fractal dimension value D_f=1 .83. An in situdynamic observation of these films under TEM with slowly heating revealed that theinitial network fractal structure was damaged gradually and broken down completelyat 535℃. And as the annealing-induced aggregation developed, the random spreadaggregated gradually, the fractal dimension of the new structure decreased with theincreasing of annealing temperature. Finally, the D_f=1.63 at 850℃. Based on thesurface and interface diffusion model of the metallic atoms, the variation of thestructural character could be explained.
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Received: 18 April 1990
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1 吴鹏,于明湘,刘买利,何大韧.应用激光,1988;8:200 2 Witten T A Jr., Sander L M. Phys Rev Lett, 1981; 47: 1400 3 Messier R. J Vac Sci Technol, 1986; A4: 490 4 Morchan B A, Demchishin A V. Phys Met Metallogr (USSR), 1969; 28: 83 5 Messier R, Yehoda J E. J Appl Phys, 1985; 58: 3739 6 张人佶,褚圣麟,吴自勤.物理学报,1986;35:365D |
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