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添加剂浓度对直流电解沉积纳米孪晶Cu微观结构的影响* |
金帅,程钊,潘庆松,卢磊( ) |
中国科学院金属研究所沈阳材料科学国家(联合)实验室, 沈阳 110016 |
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EFFECT OF ELECTROLYTE ADDITIVE CONCEN-TRATION ON MICROSTRUCTURE OF DIRECT-CURRENT ELECTRODEPOSITED NANOTWINNED Cu |
Shuai JIN,Zhao CHENG,Qingsong PAN,Lei LU( ) |
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China |
引用本文:
金帅,程钊,潘庆松,卢磊. 添加剂浓度对直流电解沉积纳米孪晶Cu微观结构的影响*[J]. 金属学报, 2016, 52(8): 973-979.
Shuai JIN,
Zhao CHENG,
Qingsong PAN,
Lei LU.
EFFECT OF ELECTROLYTE ADDITIVE CONCEN-TRATION ON MICROSTRUCTURE OF DIRECT-CURRENT ELECTRODEPOSITED NANOTWINNED Cu[J]. Acta Metall Sin, 2016, 52(8): 973-979.
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