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HFCVD生长金刚石薄膜中气体状态参数空间场模拟计算 |
宋贵宏 孙超 黄荣芳 闻立时 |
中国科学院金属研究所;沈阳 110015 |
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引用本文:
宋贵宏; 孙超; 黄荣芳; 闻立时 . HFCVD生长金刚石薄膜中气体状态参数空间场模拟计算[J]. 金属学报, 1999, 35(6): 648-653 .
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