Acta Metall Sin  1997, Vol. 33 Issue (4): 443-448    DOI:

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AN EPMA SOFTWARE FOR DETERMINATION OF THIN METAL FILM THICKNESS AND IT'S APPLICATION

SHANG Yuhua; GUO Yanfeng; LIU Zhidong; XU Leying(Institute of Metal Research; Chinese Academy of Sciences; Shenyang 110015)(Manuscript received 1996-04-08; in revised form 1996-11-20)

SHANG Yuhua; GUO Yanfeng; LIU Zhidong; XU Leying(Institute of Metal Research; Chinese Academy of Sciences; Shenyang 110015)(Manuscript received 1996-04-08; in revised form 1996-11-20). AN EPMA SOFTWARE FOR DETERMINATION OF THIN METAL FILM THICKNESS AND IT'S APPLICATION. Acta Metall Sin, 1997, 33(4): 443-448.

Abstract References Related Articles Recommended Metrics Download:  PDF(551KB)  Export:  BibTeX | EndNote (RIS)       Abstract  A software for determinating the thickness of thin metal film with EPMA was developed on the bass of Sewell's formula. It is based physically on that the exciting depth of X-ray decreased as the accelerate voltage of incident electron lowered. When the exciting depth is equal to the film depth, the ratio of X-ray intensities from film and bulk standard is unity. The thicknesses of several thin metal films of pure elements on Si and Al substrates were determined by this method, and the relative error of mass thickness is smaller than 1.6%.The minimum mass thicknesses for various elements, which can be measured, were also obtained. Key words:  measurement software      electron probe microanalyser      thin film      mass thickness      Received:  18 April 1997      Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors URL:  https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y1997/V33/I4/443 1 Sweeney W E,Seebold R E,Birds L S.J Appl Phys,1960;31:1061 2 Cockett G H,Davis C D.Br J Appl Phys,1963; 14:813 3 Weavers B A. Micron, 1979;10:285 4 Kriegler R,Schumacher B W.Plating,1960;47:393 5 Schumacher B W,Mitra S S.Electron Reliab Microminiaturization 1962;1:321 6 郭延风,徐乐英,杨淑华.电子显微学报,1992;1(1):26 7 Sewll D A.In:Castaing R ed.,Proceeding 10th International Congress on X-Ray Optics and Microanalysis.Toulouse:Journalde Physique,1984:C2—33 8Sewell D A,Love G.J Phys D:Appl Phys,1985:18:1233 9 Reuter W.J Phys D:Appl Phys,1978;11:2633 10 Ronnhult T.Scanning,1987;9:81^ [1] CAO Qingping, LV Linbo, WANG Xiaodong, JIANG Jianzhong. Magnetron Sputtering Metal Glass Film Preparation and the “Specimen Size Effect” of the Mechanical Property[J]. 金属学报, 2021, 57(4): 473-490. [2] ZHENG Xiaohang, NING Rui, DUAN Jiatong, CAI Wei. Martensitic Transformation and Damping Behavior of Ti70-xTa15Zr15Fex (x=0.3, 0.6, 1.0) Shape Memory Thin Films[J]. 金属学报, 2020, 56(12): 1690-1696. [3] Dongyu HE,Yuxin LIU. PFM Study of the 90° Step-by-Step Domain Switching and the Temperature Effect in 0.8PbTiO3-0.2Bi(Mg0.5Ti0.5)O3 Ferroelectric Thin Film[J]. 金属学报, 2019, 55(3): 325-331. [4] HE Xianmei, TONG Liuniu, GAO Cheng, WANG Yichao. Effect of Nd Content on the Structure and Magnetic Properties of Si(111)/Cr/Nd-Co/Cr Thin Films Prepared by Magnetron Sputtering[J]. 金属学报, 2019, 55(10): 1349-1358. [5] Xiaoqin MA, Qingfeng ZHAN, Jincai LI, Qingfang LIU, Baomin WANG, Runwei LI. Influence of Oblique Sputtering on Stripe Magnetic Domain Structure and Magnetic Anisotropy of CoFeB Thin Films[J]. 金属学报, 2018, 54(9): 1281-1288. [6] Yachao SUN, Minggang ZHU, Rui HAN, Xiaoning SHI, Nengjun YU, Liwei SONG, Wei LI. Magnetic Viscosity of Anisotropic Rare Earth Permanent Films[J]. 金属学报, 2018, 54(3): 457-462. [7] LI Xiaoyan. ATOMISTIC SIMULATIONS OF BAUSCHINGER EFFECT IN NANOCRYSTALLINE ALUMINUM THIN FILMS[J]. 金属学报, 2014, 50(2): 219-225. [8] SUN Lina, TAN Jun, BA Dechun, YUAN Peixin. UPCONVERSION WHITE PHOTOLUMINESCENCE AND FERROELECTRIC PROPERTY FOR Er3+-Tm3+- Yb3+ TRI-CODOPED Bi4Ti3O12 THIN FILM[J]. 金属学报, 2014, 50(1): 88-94. [9] YU Lihua, MA Bingyang, XU Junhua. INFLUENCE OF C CONTENT ON STRUCTURE AND MECHANICAL PROPERTIES OF ZrCN COMPOSITE FILMS[J]. 金属学报, 2012, 48(4): 469-474. [10] TANG Ruihe YANG Zhigang ZHANG Chi YANG Bai LIU Xiaofang YU Ronghai. MICROSTRUCTURE, MAGNETIC AND MAGNETOTRANSPORT PROPERTIES OF Co-C NANOCOMPOSITE THIN FILMS[J]. 金属学报, 2011, 47(4): 469-474. [11] LI Zhuguo MIYAKE Shoji. STRUCTURE AND OPTICAL PROPERTIES OF HIGH-RATE LOW-TEMPERATURE GROWN TiO2 THIN FILMS BY REACTIVE MAGNETRON SPUTTERING[J]. 金属学报, 2010, 46(1): 13-18. [12] ZHANG Bingsen LI Maolin WANG Jingjing SUN Benzhe QI Yang . FABRICATION AND CRYSTALLINITY OF Bi2Sr2CaCu2O8+δ THIN FILMS BY MOLECULAR BEAM EPITAXY[J]. 金属学报, 2009, 45(6): 663-672. [13] ;. THE APPLICATION OF HIGH-CONCENTRATION OZONE IN THE PREPARATION OF BI-BASED OXIDE THIN FILMS BY MOLECULAR BEAM EPITAXY[J]. 金属学报, 2008, 44(6): 647-651 . [14] ZHANG Yao; Chi-Yuen CHUNG. PITT investigation of apparent diffusion of lithium-ion through PLD-deposited HT-LiCoO2 films[J]. 金属学报, 2007, 43(8): 818-822 . [15] FU Engang; ZHUANG Daming; ZHANG Gong. Infrared properties and mechanism of Al-doped ZnO thin films[J]. 金属学报, 2005, 41(3): 333-336 . No Suggested Reading articles found! Viewed Full text Abstract Cited   Shared      Discussed