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| Influence of modulation structure on the growth behavior, structural characterization and mechanical properties of TiN/TaN multilayers |
| Qingyu Zhang |
| 大连理工大学 |
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Cite this article:
Qingyu Zhang. Influence of modulation structure on the growth behavior, structural characterization and mechanical properties of TiN/TaN multilayers. Acta Metall Sin, 2006, 42(4): 389-393 .
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Abstract TiN/TaN multilayers with same period and different modulation ratios have been fabricated using reactive magnetron sputtering methods. X-ray diffraction and high-resolution transmission electron microscopy were used to determine the structural characterization of the multilayers and their mechanical properties were measured by a nanoindentation method. The results show that modulation structure affects both the growth rate and preferred growth direction. With the increase of layer thickness (TiN or TaN), the growth rate of the layer decreases. We also find that two kinds of grains with (111) and (100) normal to the films grow epitaxtially with slightly different modulation periods. The hardness and moduli of TiN/TaN multilayers increase by about 50% and 30%, respectively. The maximum values appear at the modulation ratio of 3:1, hardness is 34.2 GPa and modulus is 344.9 GPa. Based on the structure analysis and the mechanical properties, the hardening mechanism in TiN/TaN multilayers are discussed in the paper.
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Received: 15 July 2005
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