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| Electrochemical-assisted deposition and protective properties of silane films |
| 浙江大学 |
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Cite this article:
. Electrochemical-assisted deposition and protective properties of silane films. Acta Metall Sin, 2006, 42(3): 295-298 .
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Abstract Two types of protective silane films, bis-1, 2-[triethoxysilyl] ethane (BTSE) and Dodecyltrimethoxysilane (DTMS), were deposited on LY12 aluminum alloys with the aiding of electrochemical technique. Electrochemical impedance spectroscopy (EIS) tests shows that after silanization the corrosion resistances of Al alloys are increased significantly, especially after deposition at cathodic potentials. A critical potential (CP), namely -0.8V, is generally found for each silane system, prepared at which the highest protectiveness is obtained. Scanning electron microscopy (SEM) shows that silane films prepared at CP display the highest uniformity and density. Applying potentials more positive does not facilitate the film formation. On the other hand, when potential shifts more negative the surface of films presents porous morphology, probably due to the intensive evolving of hydrogen bubbling near the surface. Due to the presence of long hydrophobic Dodecyl chain in bone structure, DTMS films display the best barrier properties.
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Received: 14 June 2005
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