PLASMA CHEMICAL VAPOUR DEPOSITION OF Ti-N-C FILMS

Acta Metall Sin

1993, Vol. 29

Issue (1): 87-92 DOI:

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PLASMA CHEMICAL VAPOUR DEPOSITION OF Ti-N-C FILMS

ZHAO Cheng;PENG Hongrui;LI Shizhi Qingdao Institute of Chemical Technology

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ZHAO Cheng;PENG Hongrui;LI Shizhi Qingdao Institute of Chemical Technology. PLASMA CHEMICAL VAPOUR DEPOSITION OF Ti-N-C FILMS. Acta Metall Sin, 1993, 29(1): 87-92.

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Abstract Plasma chemical vapour deposited (PCVD) Ti-N-C films with different Cand N contents were examined, in comparison with C-free ones, by XPS, AES, XRD, SEMand microhardness testing. The PCVD Ti-N-C film may attribute its superior wear resist-ance to its high microhardness and dense structure. The variety of valence state of oxygenatoms adsorbed on Ti-N-C or TiN film surface was detected by AES and XPS analyses.Whether or not sufficient C atoms, existing in the lattice of the films seems to be decisive. Dif-ferent states of oxygen adsorbed may cause different modes of abrasive damage of film.

Key words: plasma chemical vapour deposition Ti-N-C film TiN film

Received: 18 January 1993

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[1]	Huiying SHI, Chao YANG, Bailing JIANG, Bei HUANG, Di WANG. Influences of Target Peak Current Density on the Microstructure and Mechanical Properties of TiN Films Deposited by Dual Pulsed Power Magnetron Sputtering[J]. 金属学报, 2018, 54(6): 927-934.
[2]	YU Li; LIU Jiwen;ZHAO Jie; DAI Shaoxia;JIN Zhujing;WANG Huijun(State Key Laboratory of Corroston and Protection;Institute of Corroston and Protection of Metals; Chinese Academy of Sciences;Shenyang;110015)( Metallurgical College; Mianjing Universily;Tianjin 300400 )(Manuscript received 1995-12-06; in revised form 1996-09-02). EFFECT OF SUBSTRATE TEMPERATURE ON THE PROPERTIES OF ION PLATING TiN FILMS[J]. 金属学报, 1996, 32(12): 1270-1274.
[3]	LIU Hanwei;CHEN Yuanru (Southwest Jiaotong University; Chengdu)ZHANG Xushou (Laboratory of Solid Lubrication; Lanzhou institute of Chemical Physics;Chinese Academy of Sciences; Lanzhou). TRIBOLOGICAL PROPERTIES OF TiN FILM BY ION BEAM ASSISTED DEPOSITION[J]. 金属学报, 1994, 30(19): 323-326.
[4]	LIU Changqing; LI Meishuan; JIN Zhujing; WU Weitao (Corrosion Science Lab.; Institute of Corrosion and Protection of Metals; Academia Sinica. Shenyang 110015). TENSILE AND ADHESIVE STRENGTHS OF FINE TiN FILM ON Ti SUBSTRATE[J]. 金属学报, 1992, 28(9): 91-94.
[5]	WANG Xi;YANG Genqing;LIU Xianghuai;ZHENG Zhihong;HUANG Wei;ZHOU Zuyao;ZOU Shichang Ion Beam Laboratory; Shanghai Institute of Metallurgy; Academia Sinica. PREPARATION OF TiN FILMS BY N_2 ASSISTED Xe~+ ION BEAM ENHANCED DEPOSITION AND THEIR MECHANICAL PROPERTIES[J]. 金属学报, 1992, 28(3): 87-91.
[6]	WANG Xi;ZHOU Jiankun;CHEN Youshan;LIU Xianghuai;ZOU Shichang Ion Beam Laboratory; Shanghai Institute of Metallurgy; Academia Sinica. COMPUTER SIMULATION OF ION BEAM ENHANCED DEPOSITION OF TiN FILMS[J]. 金属学报, 1991, 27(3): 136-141.
[7]	ZHOU Jiankun;LIU Xianghuai;CHEN Youshan;WANG Xi;ZHENG Zhihong;HUANG Wei;ZOU Shichang Shanghai Institute of Metallurgy. Academia Sinica Ion Beam Laboratory;Shanghai Institute of Metallurgy;Academia Sinica; Shanghai 200050. SYNTHESIS OF TiN FILM BY ION BEAM ENHANCED DEPOSITION AND ITS PROPERTIES[J]. 金属学报, 1990, 26(2): 136-141.
[8]	LI Shizhi;XU Xiang Qingdao Institute of Chemical Technology; Qingdao; ShandongProfessor;Thin Solid Films Lab.;Qingdao Institute of Chemical Technology;53 Zhengzhou Road; Qingdao; Shandong. PLASMA CHEMICAL VAPOR DEPOSITED TiN FILMS[J]. 金属学报, 1988, 24(3): 229-235.

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