Acta Metall Sin  1991, Vol. 27 Issue (3): 150-153    DOI:

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AMORPHOUS FILMS OF ALUMINA PREPARED BY REACTIVE SPUTTERING

LOU Hanyi;ZHU Shenglong;WANG Fuhui;WU Weitao Corrosion Science Laboratory; Institute of Corrosion and Protection of Metals; Academia Sinica; Shenyang

LOU Hanyi;ZHU Shenglong;WANG Fuhui;WU Weitao Corrosion Science Laboratory; Institute of Corrosion and Protection of Metals; Academia Sinica; Shenyang. AMORPHOUS FILMS OF ALUMINA PREPARED BY REACTIVE SPUTTERING. Acta Metall Sin, 1991, 27(3): 150-153.

Abstract References Related Articles Recommended Metrics Download:  PDF(445KB)  Export:  BibTeX | EndNote (RIS)       Abstract  The deposition processes of stoichiometric alumina by means of planar magne-tron dc reactive sputtering have been invastigated. The results indicate that the oxygen patialpressure (OPP) could dramatically affect the chemical composition and crystal structure of thedeposited films and two threthold values of the OPP (threthold pressures) exist during sputter-ing. If the OPP is lower than the threthold pressures the sputtered films are mainly compo-sed of metallic aluminium with little alumina in it. When the OPP is higher than the threth-old pressures the films are only composed of the alumina. When the OPP varies near thethrethold pressures, the total gas pressure, the sputtering voltage and the depositing rate appearadrupt change, and the V-I characteristic curves display different laws. The deposited aluminawere amerphous and could crystallize at high temperature. The dc reactive sputtering mecha-nisms were discussed in this paper. Key words:  alumina film      amorphous film      reactive sputtering      Received:  18 March 1991      Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors URL:  https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y1991/V27/I3/150 1 Swaroop B, Meyer D E, White O W. J Vac Sci Technol, 1976; 13: 680 2 Koeniger M E, Reithmeier G. Simon M. Thin Solid Films, 1983; 109: 19 3 Nowicki R S. J Vac Sci Technol, 1977; 14(1) : 127 4 Demiryont H, Tezey N. Thin Solid Films, 1983; 101: 345 5 Morssinkhof R W. Fransen T, Heusinkveld M M, Gellings P J. Mater Sci Technol, 1989; A121: 449 6 Rosebury F. Handbook of Electron Tube and Vacuum Techniques. Reading Mass; Addison-Wesley, 1965: 475--476 7 Yosson J L, O'Neill J J, Finlayson K M, Royer L J. RCA Rev, 1970; 31: 293 8 Jones F, Logan J. J Vac Sci Technol. 1989; A7: 1240| [1] Bin WANG,Liangyin XIONG,Shi LIU. MgO SECONDARY ELECTRON EMISSION FILM PREPARED BY RADIO-FREQUENCY REACTIVE SPUTERRING[J]. 金属学报, 2016, 52(1): 10-16. [2] HONG Bo; JIANG Chuanhai; WANG Xinjian; WU Jiansheng. Phase transformation behaviour and kinetics of electrodeposition Ni-P amorphous alloys by X-ray analysis[J]. 金属学报, 2006, 42(7): 699-702 . [3] WANG Peixuan;LI Shengli;ZHANG Guoguang; ZHANG Jianwei; MA Ruzhang (University of Science and Technology Beijing). CHANGES IN STRUCTURE AND MAGNETIC PROPERTIES OF AMORPHOUS Fe-Dy MULTILAYERS DURING CRYSTALLIZATION[J]. 金属学报, 1994, 30(15): 116-120. [4] LU Manqi;WANGENDRISTEL A State Key Laboratory of Rapidly Solidified and Non-Equilibrium Alloys; Institute of Metal Research; Acadimia Sinica; International centre for Materials Physics; Acadimia Sinica; Shenyang Institue for Applied Physics; Technical University Vienna; Austria associate professor;Institute of Metal Research;Academia Sinica;Shanyang 110015. IN SITU TEM OBSERVATION OF AMORPHOUS Nd_χFe_(1-χ) THIN FILMS AND THEIR CRYSTALLIZATION[J]. 金属学报, 1993, 29(4): 85-90. No Suggested Reading articles found! Viewed Full text Abstract Cited   Shared      Discussed