COMPUTER SIMULATION OF ION BEAM ENHANCED DEPOSITION OF TiN FILMS
WANG Xi;ZHOU Jiankun;CHEN Youshan;LIU Xianghuai;ZOU Shichang Ion Beam Laboratory; Shanghai Institute of Metallurgy; Academia Sinica
Cite this article:
WANG Xi;ZHOU Jiankun;CHEN Youshan;LIU Xianghuai;ZOU Shichang Ion Beam Laboratory; Shanghai Institute of Metallurgy; Academia Sinica. COMPUTER SIMULATION OF ION BEAM ENHANCED DEPOSITION OF TiN FILMS. Acta Metall Sin, 1991, 27(3): 136-141.
Abstract A Monte-Carlo comupter simulation has been performed to describe, atatomic level, the growth of TiN films formed by ion beam enhanced deposition(IBED). The simulation is based on a random target, fixed free path of moving par-ticles and binary collisions. An alternate process of deposition of titanium atomsand implantation of nitrogen ions is applied instead of the actual continuous andsynchronous process of IBED. According to the actual conditions, the adsorptionof nitrogen gas, which is leaked out from the ion source, at the fresh titaniumlayer surface has been considered. In addition, the change of the composition pro-file and the density profile during film growth is taken into account. It shows thatthe titanium deposition rate has strong influence on the film composition. Whenthe titanium deposition rate is low, the nitrogen concentration of the film is rela-tively insensitive to the atomic arrival ratio, R, of implanted nitrogen ions to de-posited titanium atoms. It is demonstrated that the width of the intermixed regionbetween the film and substrate increases with the increase of R. The results obtain-ed are in agreement with the experimental measurements.
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YU Li; LIU Jiwen;ZHAO Jie; DAI Shaoxia;JIN Zhujing;WANG Huijun(State Key Laboratory of Corroston and Protection;Institute of Corroston and Protection of Metals; Chinese Academy of Sciences;Shenyang;110015)( Metallurgical College; Mianjing Universily;Tianjin 300400 )(Manuscript received 1995-12-06; in revised form 1996-09-02). EFFECT OF SUBSTRATE TEMPERATURE ON THE PROPERTIES OF ION PLATING TiN FILMS[J]. 金属学报, 1996, 32(12): 1270-1274.
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XU Dong;ZHU Hong; TANG Lijuan;YANG Yunjie; ZHENG Zhihong; LIU Xianghuai(Ion Beam Laboraiory; Shanghai Institute of Metallurgy; Chinese Academy of Sciences; Shanghai 200050) TA NIGUCHI S; SHIBATA T(Department of Materi als Science and Processing; Faculty of Engineering; Osaka University; Japan)(Manuscript received 1994-02-19; in revised form 1994-11-30). IMPROVEMENT OF OXIDATION RESISTANCE OF TiAl BY ION-BEAM-ENHANCED DEPOSITION OF Si_3N_4 COATINGS[J]. 金属学报, 1995, 31(16): 164-172.
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LIU Hanwei;CHEN Yuanru (Southwest Jiaotong University; Chengdu)ZHANG Xushou (Laboratory of Solid Lubrication; Lanzhou institute of Chemical Physics;Chinese Academy of Sciences; Lanzhou). TRIBOLOGICAL PROPERTIES OF TiN FILM BY ION BEAM ASSISTED DEPOSITION[J]. 金属学报, 1994, 30(19): 323-326.
