D<sup>+</sup>离子束辐照对Ti膜的影响

doi:10.3724/SP.J.1037.2010.00017

金属学报

2010, Vol. 46

Issue (7): 810-813 DOI: 10.3724/SP.J.1037.2010.00017

论文

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D⁺离子束辐照对Ti膜的影响

王博宇¹⁾, 向伟¹⁾, 谈效华¹⁾, 戴晶怡¹⁾, 程亮¹⁾, 秦秀波²⁾

1) 中国工程物理研究院电子工程研究所, 绵阳 621900
2) 中国科学院高能物理研究所核分析技术重点实验室, 北京 100049

EFFECT OF D⁺ BEAM IRRADIATION ON Ti FILM

WANG Boyu¹⁾, XIANG Wei¹⁾, TAN Xiaohua¹⁾, DAI Jingyi¹⁾, CHENG Liang¹⁾, QIN Xiubo²⁾

1) Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang 621900
2) Key Laboratory of Nuclear Analysis Techniques, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049

引用本文:

王博宇向伟谈效华戴晶怡程亮秦秀波. D⁺离子束辐照对Ti膜的影响[J]. 金属学报, 2010, 46(7): 810-813.
, . EFFECT OF D⁺ BEAM IRRADIATION ON Ti FILM[J]. Acta Metall Sin, 2010, 46(7): 810-813.

全文: PDF(769 KB)

摘要:

在加速器上, 利用不同能量的D⁺离子束对Ti膜进行连续辐照, 利用慢正电子湮没技术和SEM对束流辐照前后Ti膜进行表征. 结果表明, D⁺离子束对Ti膜造成辐照损伤, 随D⁺离子束能量增大, 辐照损伤的程度加重; 辐照损伤最大值在0.3 μm处; D⁺离子束对Ti膜表面造成不同程度的烧蚀, 随D⁺离子束能量增加, 膜表面烧蚀程度增加, 膜表面几何不均匀性导致膜表面出现选择性烧蚀. 数值计算表明, 随能量增加, D⁺离子在Ti膜中的能量沉积增大, 这与SEM观测结果相符.

关键词 ： D⁺, Ti膜, 慢正电子湮没技术

Abstract：

Effect of the D⁺ ion beam on Ti film is studied by radiating the Ti films with different energy D⁺ beams on electrostatic accelerator. Slow positron annihilation spectroscopy and SEM are used to characterize the films. With the D⁺ beam energy increases, the extent of radiation damage and the surface ablation of Ti films increase. The maximum of radiation damage locates at 0.3 μm depth. The geometrical non-uniformity on original surface is the main reason for the ablation behavior on Ti films by inducing a selective ablation under radiation. Radiation damage and energy loss of D⁺ in Ti film are discussed in detail by the numerical simulation of the beam and the solid interaction. It shows that the maximum radiation damage is at 0.65 $\mu$m depth and energy loss of D⁺ beam in Ti films accords with the experimental observation.

Key words： D⁺ Ti film slow positron annihilation spectroscopy

收稿日期: 2010-01-08

基金资助:

中国工程物理研究院电子工程研究所科技创新基金资助项目S20090801

作者简介: 王博宇, 男, 1982年生, 助理研究员

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https://www.ams.org.cn/CN/10.3724/SP.J.1037.2010.00017 或 https://www.ams.org.cn/CN/Y2010/V46/I7/810

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