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透明导电氧化物ZnO:Al(ZAO)薄膜的研究 |
裴志亮 谭明晖 |
中国科学院金属研究所; 沈阳 110015 |
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引用本文:
裴志亮; 谭明晖 . 透明导电氧化物ZnO:Al(ZAO)薄膜的研究[J]. 金属学报, 2000, 36(1): 72-76 .
[1] Chen M. PhD thesis, Institute of Metal Research, The Chinese Academy of Sciences, Shenyang, 1999(陈猛.中国科学院金属研究所博士. 沈阳, 1999) [2] Hartnaged H L, Dawar A L, Jain A K, Jagadish C. Semiconducting Transparent Thin Films. London, 1995 [3] Yang T L, Zhang D H, Ma J, Ma H L, Chen Y. Thin SolidFilms, 1998, 326: 60 [4] Neumann G. In: Kaldis E ed., Current Topics in MaterialScience, Vol. 7, Amsterdam: North Holland, 1981: 153 [5] Heiland G, Mollwo E, Stochmann F, Frederick S C, TurnbullD. Solid State Phys Advances in Research and Applications,Vol.8, New York: Academic Press, 1959: 191 [6] Islam M N, Ghosh T B, Chopra K L, Acharya H N. ThinSolid Film, 1996; 280: 20 [7] Fan J C C, Goodenough J B. J Appl Phys, 1977; 48: 3524 [8] Jiang X C, Hu Y. Vacuum, 1995; 6(1): 1(姜燮昌,胡勇.真空. 1995; 6(1): 1) [9] Sato H, Minami T, Takata S, Mouri T, Ogawa N. ThinSolid Films, 1992; 230. 327 |
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