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金属学报  1979, Vol. 15 Issue (3): 359-447    
  论文 本期目录 | 过刊浏览 |
非晶态Gd-Co薄膜的晶化过程和磁畴结构
杨翠英;周玉清;赵见高
中国科学院物理研究所;中国科学院物理研究所;中国科学院物理研究所
CRYSTALLIZATION PROCESS AND DOMAIN STRUCTURE OF AMORPHOUS Gd-Co THIN FILMS
Yang Cuiying;Zhou Yuqing;Zhao Jiangao Institute of Physics; Academia Sinica
引用本文:

杨翠英;周玉清;赵见高. 非晶态Gd-Co薄膜的晶化过程和磁畴结构[J]. 金属学报, 1979, 15(3): 359-447.
, , . CRYSTALLIZATION PROCESS AND DOMAIN STRUCTURE OF AMORPHOUS Gd-Co THIN FILMS[J]. Acta Metall Sin, 1979, 15(3): 359-447.

全文: PDF(3384 KB)  
摘要: <正> 一、引言 前人研究非晶态金属和合金的晶化过程,包括用电子显微镜和电子衍射的直接观察,X射线小角及大角散射的分析及差热扫描量热计的热分析等,大都是研究液态金属快速冷却法制备的样品,但对于气态沉积的材料较少研究。我们用电子显微镜观察了溅射非晶态Gd-Co薄膜的晶化过程,并对其晶化规律及特征进行了讨论,以期与液态快冷的非晶态合金作比较,同时还初步观察了磁畴随温度变化的情况。
Abstract:The crystallization process of Gd_(17)-Co_(83) sputtered thin films has been exami-ned by electron microscopy and electron diffraction. The samples showed a typicalamorphous feature at room temperature and a crystalline state under 550℃. It wasobserved that the crystallization process of Gd_(17)-Co_(83) films underwent a change fr-om an amorphous state through two steps of metastable phase Ⅰ and Ⅱ, and theninto a stable state finally. The metastable phase Ⅱ, however, was not a single ph-ase, but was a mixture of several complex metastable phases. The influence of tem-perature on the domain structure of amorphous Gd-Co thin films has also beenstudied.
收稿日期: 1979-03-18     
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