金属学报 DOI: 10.11900/0412.1961.2024.00290 |
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集成电路芯片互连微凸点电迁移:从物理本质到可靠性提升 |
黄明亮,王胜博,尤海潮,刘厚麟,任婧,黄斐斐 |
大连理工大学 材料科学与工程学院 电子封装材料实验室 大连 116024
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Electromigration of micro solder bumps in chip interconnections of integrated circuits: from physical nature to reliability improvement |
HUANG Mingliang, WANG Shengbo, YOU Haichao,
LIU Houlin, REN Jing, HUANG Feifei |
Electronic Packaging
Materials Laboratory, School of Materials Science and Engineering, Dalian
University of Technology, Dalian 116024, China
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引用本文:
黄明亮 王胜博 尤海潮 刘厚麟 任婧 黄斐斐. 集成电路芯片互连微凸点电迁移:从物理本质到可靠性提升[J]. 金属学报, 10.11900/0412.1961.2024.00290.
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