Abstract The surface morphologies of Cu thin films deposited by magnetron sputtering were obtained by atomic force microscopy (AFM). From AFM images, power spectrum density (PSD) and roughness measurement methods were proposed to obtain dynamic scaling exponents of the film surface evolution. The results show that the film surface evolution has multi-scale characteristic. The global roughness exponent and growth exponent are 0.83 and 0.85, respectively, whereas the local roughness exponent and growth exponent are 0.88 and 0.26, respectively. The local dynamic surface evolution is consistent with that predicted by surface diffusion-dominated growth model. The global surface dynamic evolution exhibits anomalous scaling characteristic, which arises from bulk diffusion mechanism during the films grown at high temperature.
[1]Meakin P.Fractal,Scaling and Growth Far From Equilib- rium.Cambridge:Cambridge University Press,1998 [2]Family F,Viscek T.J Phys,1985;18A:L75 [3]Barabasi A L,Stanley H E.Fractal Concepts in Surface Growth.Cambridge:Press Syndicate of the University of Cambridge,1995 [4]Srolovitz D J,Mazor A,Bukiet B G.J Vac Sci Technol, 1988;6A:2371 [5]Wollschl(?)ger J,Luo E Z,Henzler M.Phys Rev,1998;57B: 15541 [6]Huo S,Schwaxzacher W.Phys Rev Lett,2001;86:256 [7]Lita A E,Sanchez J E.Phys Rev,2000;61B:7692 [8]Auger M A,Vázques L,Cuerno R,Castro M,Jergel M, Sánchez O.Phys Rev,2006;73B:045436 [9]Murarka S P.Mat Sci Eng,1997;R19:87 [10]Palasantzas G,Zhao Y P,Wang G C,Lu T M,Barnas J, Hosson J T M.Phys Rev,2000;61B:11109 [11]Jeffries J H,Zuo J K,Craig M M.Phys Rev Lett,1996; 76:4931 [12]Dalakos G T,Plawsky J P,Persans P H.Phys Rev,2005; 72B:205305 [13]Flewitt A J,Robertson J,Milne W I.J Appl Phys,1999; 85:8032 [14]Hasan N M,Mallett J J,dos Santos S G,Pasa A A, Schwarzacher W.Phys Rev,2003;67B:081401 [15]Ojeda F,Cuerno R,Salvarezza R,Vázquez L.Phys Rev Lett,2000;84:3125 [16]Kant R.Phys Rev,1996;53E:5749 [17]Messier R,Yehoda J E.J Appl Phys,1985;58:3739 [18]Barna P B,Adamik M.Thin Solid Films,1998;317:27 [19]Chen D Q,Zheng Z Q,Liu Z Y,Li S C.Acta Metall Sin, 2003;39:1238 (陈大钦，郑子樵，刘祖耀，李世展．金属学报，2003；39：1238) [20]Saitou M,Makabe A,Tomoyose T.Surf Sci,2000;459: L462 [21]Vázquez L,Salvarezza R C,Herrasti P,Ocón P,Vara J M,Arvia A J.Phys Rev,1995;52B:2032
