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| PITT investigation of apparent diffusion of lithium-ion through PLD-deposited HT-LiCoO2 films |
| ZHANG Yao;Chi-Yuen CHUNG; |
| 华南理工大学机械学院 |
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Cite this article:
ZHANG Yao; Chi-Yuen CHUNG. PITT investigation of apparent diffusion of lithium-ion through PLD-deposited HT-LiCoO2 films. Acta Metall Sin, 2007, 43(8): 818-822 .
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Abstract In this work, LiCoO2 films were prepared with the pulsed laser deposition (PLD) method. Their structure was characterized by X-ray diffraction, Raman spectra and Scanning electron microscopy and their electrochemical properties were evaluated with cyclic voltammetry (CV). Results showed that LiCoO2 films prepared with PLD at 600℃ had a well-crystallized columnar HT-LiCoO2 structure with the average grain size less than 100nm and with a strong [001] preferred orientation, while these films contain trace amount of Co3O4. CV tests indicated that PLD-deposited HT-LiCoO2 films had good electrochemical reversibility but only a pair of redox peaks near 3.9V(vs Li) were observed in the cyclic voltammograms. Thereafter, emphasis was laid on the study of apparent diffusion of lithium-ion through LiCoO2 films using the potentiostatic intermittent titration technique (PITT). PITT measurements revealed that the lithium-ion diffusion coefficient of PLD-deposited HT-LiCoO2 films reached 10-8~10-9cm2s-1, 1-2 orders of magnitude faster than those prepared by other methods including R.F. magnetron sputtering and, in the voltage range between 3.85~3.95V(vs Li), the lithium-ion diffusion coefficient of PLD-deposited HT-LiCoO2 films was 1-2 orders of magnitude lower than other voltage ranges. The former should be ascribed to the grain refinement of PLD-deposited HT-LiCoO2 films and existence of many voids, while the later may due to the hindrance arising from phase boundary movement.
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Received: 04 December 2006
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