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| DIFFRACTION INTENSITY OF SEEMANNBOHLIN X-RAY DIFFRACTION ATTACHMENT FOR THIN FILM ANALYSIS |
| by TAO Kun; DONG Zhili; CHEN Shunying; WANG Bingju (Institute of Materials Science; Tsinghua University; Beijing)(Manuscript recived 23 August; 1985; revised manuscript 7 March; 1987) |
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Cite this article:
by TAO Kun; DONG Zhili; CHEN Shunying; WANG Bingju (Institute of Materials Science; Tsinghua University; Beijing)(Manuscript recived 23 August; 1985; revised manuscript 7 March; 1987). DIFFRACTION INTENSITY OF SEEMANNBOHLIN X-RAY DIFFRACTION ATTACHMENT FOR THIN FILM ANALYSIS. Acta Metall Sin, 1987, 23(5): 486-491.
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Abstract A Seemann-Bohlin X-ray diffraction attachment for thin film analysis has been developed and the" diffraction intensity of it has also been discussed. The results of calculation show that: (1) The diffraction intensity for solid surface or thin film analyzed by this attachment is 7—20 times as high as that by ordinary diffractometer. For example, to analyse a Au film of 7nm thickness using a 1 kW X-ray source, a fairly good diffraction pattern was obtained up to 2θ=120° with the scanning speed of 4° (2θ)/min. (2) It can also be used for determining of thick polycrystalline samples. In this case, its diffraction intensity is 3—20 times as high as that of ordinary diffractometer. These conclusions were confirmed by experimental results.
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Received: 18 May 1987
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1 Rigaku Corporation. The Rigaku Journal, 1984; 1 (2) : 22
2 Mack M, Parrish W. Acta Crystallogr, 1967: 23: 693
3 范雄.X射线金属学,机械工业出版社,1981:51 |
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