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CORRELATION BETWEEN CONSTITUENT AND SPUTTERING RATE OF BINARY ALLOYS IN GLOW DISCHARGE LAMP |
REN Jianshi;ZHANG Gongshu;WANG Zhenshu;LIU Gen;LIU Shenglin Institute of Metal Research; Academia Sinica; Shenyang; Shanghai University of Technology Correspondent senior engineer; Institute of Metal Research; Academia Sinica; Shenyang 110015 |
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Cite this article:
REN Jianshi;ZHANG Gongshu;WANG Zhenshu;LIU Gen;LIU Shenglin Institute of Metal Research; Academia Sinica; Shenyang; Shanghai University of Technology Correspondent senior engineer; Institute of Metal Research; Academia Sinica; Shenyang 110015. CORRELATION BETWEEN CONSTITUENT AND SPUTTERING RATE OF BINARY ALLOYS IN GLOW DISCHARGE LAMP. Acta Metall Sin, 1992, 28(5): 85-89.
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Abstract Investigation was made of the sputtering rate in glow discharge lamp with re-lation to constituent of 25 different specimens of 6 binary systems, namely, Cr-Fe, Bi-Sb,Cu-Zn, Ag-Cu, Al-Zn and Cd-Sn, by measuring mass loss after each sputtering under con-stant Ar pressure and voltage applied. The correlation, in general, between sputtering rate andconcentration of constituent of these non-intermetallic binary alloys obeys the hyperbolic lawunder steady state, yet may be approximately regarded as linear only on certain special condi-tion if the two components of the alloys with similar sputtering rates.
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Received: 18 May 1992
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