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CRYSTAL DEFECTS AND INTERFACE STRUCTURE OF ION-NITRIDED LAYERS |
LI Fengzhao;DAI Jiyan;LI Douxing Shandong Polytechnic University; Jinan; Laboratory of Atomic Imaging of Solids; Institute of Metal Research; Academia Sinica; Shenyang Laboratory of Atomic Imaging of Solids; Institute of Metal Research; Academia Sinica; ShenyangSUN Dongsheng;assoeiate professor.Institute of Materials Engineering.Shandong Polytechnic University ;Jinan 250014 |
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Cite this article:
LI Fengzhao;DAI Jiyan;LI Douxing Shandong Polytechnic University; Jinan; Laboratory of Atomic Imaging of Solids; Institute of Metal Research; Academia Sinica; Shenyang Laboratory of Atomic Imaging of Solids; Institute of Metal Research; Academia Sinica; ShenyangSUN Dongsheng;assoeiate professor.Institute of Materials Engineering.Shandong Polytechnic University ;Jinan 250014. CRYSTAL DEFECTS AND INTERFACE STRUCTURE OF ION-NITRIDED LAYERS. Acta Metall Sin, 1993, 29(5): 11-15.
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Abstract Observation under high resolution electron microscope shows that the contin-uous bombing of high speed ions produces a great amount of vacant site defects. The assem-bly of vacancies forms vacant dish, and the collapase of vacant dish forms stacking faulttetrahedrons and other crystal defects. The interfaces between phase ε(Fe_(2-3)N) and phaseγ′(Fe_4N) are smooth, straight and coherent, and they have the orientation relationships of(111)//(0001) and [110]/[1120].
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Received: 18 May 1993
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