Abstract Multilayered Co/Pd nanostructure films are deposited on monocrystalline silicon(111) by using double-bath method and the technological conditions are determined. The mechanism of the growth kinetics for Co and Pd layers have been studied ,It is showed that the growth kinetics for Co and Pd are consistent with progressive nucleation.The mass change of layers are exactly measured by EQCM . XRD results suggest that the multilayer have good crystal lattice,and alloy-intermediate of Co and Pd are also found .In addition,hysteresis loops are measured by PPMS at room temperature .The result showed that : with decrease of Co thickness ,coercive force was increased and which up to 1130 Oe.