Acta Metall Sin  2005, Vol. 41 Issue (7): 763-768     DOI:

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Effect of Oxalic Acid Etching on Morphology and Electrocatalytic Activity of Oxide Anodes

CHU Liying; XU Likun; WU Lianbo;WANG Tingyong; WANG Juntao;CHEN Guangzhang

State Key Laboratory for Marine Corrosion and Protection; Luoyang Ship Materials Research Institute; Qingdao 266071

CHU Liying; XU Likun; WU Lianbo; WANG Tingyong; WANG Juntao; CHEN Guangzhang. Effect of Oxalic Acid Etching on Morphology and Electrocatalytic Activity of Oxide Anodes. Acta Metall Sin, 2005, 41(7): 763-768 .

Abstract References Related Articles Recommended Metrics Download:  PDF(500KB)  Export:  BibTeX | EndNote (RIS)       Abstract  IrO2--Ta2O5 oxide anode was prepared by coating oxide on titanium substrate which has been pretreated by sandblast and oxalic acid etching. ESEM, polarization curve and EIS indicated that the corrosion rate of the substrate and the loading of the oxide coating (i.e. Ir content) increase with etching time at the initial stage and then decrease. The oxide coating on the substrate pretreated by suitable etching pretreatment is of a uniform and compact surface which has large electrochemical active surface area, fine electrocatalytic activity for oxygen evolution and high stability. Key words:  oxide anode      etching      oxalic acid       Received:  04 November 2004      ZTFLH:  TG172   Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors CHU Liying XU Likun WU Lianbo WANG Tingyong WANG Juntao CHEN Guangzhang URL:  https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y2005/V41/I7/763 [1] Trasatti S. Electrochim Acta, 2000; 45: 2377 [2] Comninellis Ch, Vercesi G P. J Appl Electrochem, 1991; 21: 335 [3] Rolewicz J, Cominiellis Ch, Plattner E, Hinden J. Elec trochim Acta, 1988; 33: 573 [4] Mraz R, Krysa J. J Appl Electrochem, 1994; 24: 1262 [5] Xu L K, Scantlebury J D. J Electrochem Soc, 2003; 150: B288 [6] Xu L K, Scantlebury J D. J Electrochem Soc, 2003; 150: B254 [7] Martelli G N, Ornelas R, Faita G. Electrochim Acta, 1994; 39: 1551 [8] Krysa J, Kule L, Mraz R, Rousar I. J Appl Electrochem, 1996; 26: 999 [9] Krysa J, Maixner J, Mraz R, Rousar I. J Appl Electrochem, 1998; 28: 369 [10] Krysa J, Mraz R. Electrochim Acta, 1995; 40: 1997 [11] Otogawa R, Morimitsu M, Matsunaga M. Electrochim Acta, 1998; 44: 1509 [12] Hu J M, Meng H M, Zhang J Q, Cao C N. Acta Metall Sin, 2002; 38: 69 (胡吉明,孟惠民,张鉴清,曹楚南．金属学报,2002;38:69) [13] Xu L K, Scantlebury J D. Corros Sci, 2003; 45: 2729 [14] Beck F. Electrochim Acta, 1989; 34: 811 [15] Loucka T. J Appl Electrochem, 1997; 7: 211 [16] Roginskaya Yu E, Morozova O V, Loubnin E N, Popov A V, Ulition Yu I, Zhurov V V, Ivanov S A, Trasatti S. J Chem Soc Faraday Trans, 1993; 89: 1707 [17] Wen T C, Hu C C. J Electrochem Soc, 1992; 139: 2158 [18] Shieh D T, Hwang B J. Electrochim Acta, 1993; 38: 2239 [19] Lassali T A F, Boodts J F C, Bulhoes L O S. Electrochim Acta, 1999; 44: 4203 [20] Hu J M, Meng H M, Zhang J Q, Wu J X, Yang D J, Cao C N. Acta Metall Sin, 2001; 37: 628 (胡吉明,孟惠民,张鉴清,吴继勋,杨德钧,曹楚南,金属学 报,2001;37:628) [1] GAO Han, LIU Li, ZHOU Xiaoyu, ZHOU Xinyi, CAI Wenjun, ZHOU Hongling. Preparation and Bioactivity of Micro-Nano Structure on Ti6Al4V Surface[J]. 金属学报, 2023, 59(11): 1466-1474. [2] HE Chunlin, YANG Xuefei, MA Guofeng, WANG Jianming, ZHAO Dongliang,CAI Qingkui. EFFECT OF MOLE FRACTION OF HF AND H2O2 ON MORPHOLOGY OF POROUS SILICON FORMED BY Ag ASSISTED CHEMICAL ETCHING[J]. 金属学报, 2013, 49(8): 989-995. [3] XU Qunjie DENG Xianqin PAN Hongtao YUN Hong. ELECTROCHEMICAL BEHAVIOR OF B30 Cu-Ni ALLOY WITH SUPER-HYDROPHOBIC SURFACE IN 3.5%NaCl SOLUTION[J]. 金属学报, 2012, 48(1): 94-98. [4] Rong Wang. A HRTEM study on a modulation structure in NiAl3 after ion etching[J]. 金属学报, 2008, 44(10): 1153-1156 . [5] WANG Ruimin; CHU Wuyang; SU Yanjing; GAO Kewei; QIAO Lijie. Domain switching and indentation crack propagating in BaTiO3 single crystal induced by etching[J]. 金属学报, 2005, 41(3): 297-301 . [6] ZHANG Baofa;SHEN Wanci;LIU Yingjie; WANG Yuanfei;TANG Xiangyun (Tsinghua University;Beijing 100084). ADIABATIC SHEAR BAND IN WHITE-ETCHING LAYER[J]. 金属学报, 1997, 33(11): 1161-1164. No Suggested Reading articles found! Viewed Full text Abstract Cited   Shared      Discussed