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| A Mathematical Model on Coalescence and Removal of Inclusion Particles in Continuous Casting Tundish |
| CHANG Haiwei; CHEN Tao; LEI Mingkai |
| Department of Materials Engineering; Dalian University of Technology; Dalian 116024 |
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Cite this article:
CHANG Haiwei; CHEN Tao; LEI Mingkai. A Mathematical Model on Coalescence and Removal of Inclusion Particles in Continuous Casting Tundish. Acta Metall Sin, 2004, 40(6): 629-.
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Abstract A mass transfer model has been built up for metal ion implantation into Al target at elevated temperature, based on the transport of ions in matter and the radiation enhanced diffusion theory, which is applicable to calculate the concentration--depth profiles of the implanted species. With the model, the ion implantation process at elevated temperature was simulated by the Monte Carlo method and the local saturation behavior in the crystal target simulated using a maximum allowed atomic fraction. Moreover, the diffusion process was described with the radiation enhanced diffusion theory. Thus the concentration--depth profiles of the implanted species were determined from the diffusion equations for the implanted species and nonequilibrium vacancies, and the radiation enhanced diffusion coefficient was obtained by taking into account the linear annealing defects. The nonequilibrium vacancy source function and the surface sputtering effects were introduced in the diffusion equations. The calculated concentration-depth profiles of Cr ions implanted into Al are consistent with the experimental ones at the target temperatures of 250, 400 and 510℃, with an ion energy of 140 keV.
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Received: 01 July 2003
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