Acta Metall Sin  1990, Vol. 26 Issue (2): 136-141    DOI:

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SYNTHESIS OF TiN FILM BY ION BEAM ENHANCED DEPOSITION AND ITS PROPERTIES

ZHOU Jiankun;LIU Xianghuai;CHEN Youshan;WANG Xi;ZHENG Zhihong;HUANG Wei;ZOU Shichang Shanghai Institute of Metallurgy. Academia Sinica Ion Beam Laboratory;Shanghai Institute of Metallurgy;Academia Sinica; Shanghai 200050

ZHOU Jiankun;LIU Xianghuai;CHEN Youshan;WANG Xi;ZHENG Zhihong;HUANG Wei;ZOU Shichang Shanghai Institute of Metallurgy. Academia Sinica Ion Beam Laboratory;Shanghai Institute of Metallurgy;Academia Sinica; Shanghai 200050. SYNTHESIS OF TiN FILM BY ION BEAM ENHANCED DEPOSITION AND ITS PROPERTIES. Acta Metall Sin, 1990, 26(2): 136-141.

Abstract References Related Articles Recommended Metrics Download:  PDF(969KB)  Export:  BibTeX | EndNote (RIS)       Abstract  The TiN film was synthesized by alternate deposition of Ti and nitro-gen ion bombardment under 40 keV at room temperature. The component depthprofiles and the structure of the film have been investigated by means of RBS,AES, TEM, XPS and X-ray diffraction. The results showed that the TiN films syn-thesized by ion beam enhanced deposition (IBED) are mainly composed of TiNcrystallites, sized about 30-40 nm, with random orientation. The oxygen contaminationin TiN film prepared by IBED is less than that of the deposited film without nitrogenion bombardment. It was confirmed that there is a significant intermixed layer, about40nm thick, at the interfaces. The films formed by IBED exhibit superior hardnessand improvement over the wear resistance and frictiton properties. Key words:  TiN film      ion beam enhanced deposition      Received:  18 February 1990      Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors URL:  https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y1990/V26/I2/136 1 Rossnagel S M, Cuomo J J. MRS Bull, 1987; 16: 40 2 Happer J M E, Cuotm J J, Gambino R J, Kaufman H R. Nucl Instrum Meth Phys Res, 1985; B7/8: 915 3 Kant R A, Sartwell B D, Singer I L, Vardiman R G. Nucl Instrum Meth Phys Res, 1985; B7/8: 915 4 Sartwell B D. In: Hochman R F ed., Ion Plating and Implantation, Metals Park: ASM, 1986: 81 5 Kiuchi M, Tomita M, Fujii K, Satou M, Shimizu R. Jpn J Appl Phys. 1987; 26: 98 Satou M, Andoh Y, Ogata K, Suzuki Y, Matsuda K, Fujimoto F. Jpn J Appl Phys, 1985; 24: 656 6 Liu Xianghuai, Xue Bin. Zheng Zhihong, Zhou Zuyao, Zou Shichang. Nucl Instrum Meth Phys Res, 1989; B39: 185 7 Dawson P T, Tzatzov K K. Surf Sci, 1985; 149: 10 [1] Huiying SHI, Chao YANG, Bailing JIANG, Bei HUANG, Di WANG. Influences of Target Peak Current Density on the Microstructure and Mechanical Properties of TiN Films Deposited by Dual Pulsed Power Magnetron Sputtering[J]. 金属学报, 2018, 54(6): 927-934. [2] YU Li; LIU Jiwen;ZHAO Jie; DAI Shaoxia;JIN Zhujing;WANG Huijun(State Key Laboratory of Corroston and Protection;Institute of Corroston and Protection of Metals; Chinese Academy of Sciences;Shenyang;110015)( Metallurgical College; Mianjing Universily;Tianjin 300400 )(Manuscript received 1995-12-06; in revised form 1996-09-02). EFFECT OF SUBSTRATE TEMPERATURE ON THE PROPERTIES OF ION PLATING TiN FILMS[J]. 金属学报, 1996, 32(12): 1270-1274. [3] XU Dong;ZHU Hong; TANG Lijuan;YANG Yunjie; ZHENG Zhihong; LIU Xianghuai(Ion Beam Laboraiory; Shanghai Institute of Metallurgy; Chinese Academy of Sciences; Shanghai 200050) TA NIGUCHI S; SHIBATA T(Department of Materi als Science and Processing; Faculty of Engineering; Osaka University; Japan)(Manuscript received 1994-02-19; in revised form 1994-11-30). IMPROVEMENT OF OXIDATION RESISTANCE OF TiAl BY ION-BEAM-ENHANCED DEPOSITION OF Si_3N_4 COATINGS[J]. 金属学报, 1995, 31(16): 164-172. [4] LIU Hanwei;CHEN Yuanru (Southwest Jiaotong University; Chengdu)ZHANG Xushou (Laboratory of Solid Lubrication; Lanzhou institute of Chemical Physics;Chinese Academy of Sciences; Lanzhou). TRIBOLOGICAL PROPERTIES OF TiN FILM BY ION BEAM ASSISTED DEPOSITION[J]. 金属学报, 1994, 30(19): 323-326. [5] LIU Changhong;LI Wenzhi;LI Hengde (Tsinghua University; Beijing). INFLUENCE OF CH_4 ION BEAM ENHANCED DEPOSITION ON HARDNESS OF TiC FILMS[J]. 金属学报, 1994, 30(19): 318-322. [6] ZHAO Cheng;PENG Hongrui;LI Shizhi Qingdao Institute of Chemical Technology. PLASMA CHEMICAL VAPOUR DEPOSITION OF Ti-N-C FILMS[J]. 金属学报, 1993, 29(1): 87-92. [7] LIU Changqing; LI Meishuan; JIN Zhujing; WU Weitao (Corrosion Science Lab.; Institute of Corrosion and Protection of Metals; Academia Sinica. Shenyang 110015). TENSILE AND ADHESIVE STRENGTHS OF FINE TiN FILM ON Ti SUBSTRATE[J]. 金属学报, 1992, 28(9): 91-94. [8] WANG Xi;YANG Genqing;LIU Xianghuai;ZHENG Zhihong;HUANG Wei;ZHOU Zuyao;ZOU Shichang Ion Beam Laboratory; Shanghai Institute of Metallurgy; Academia Sinica. PREPARATION OF TiN FILMS BY N_2 ASSISTED Xe~+ ION BEAM ENHANCED DEPOSITION AND THEIR MECHANICAL PROPERTIES[J]. 金属学报, 1992, 28(3): 87-91. [9] WANG Xi;ZHOU Jiankun;CHEN Youshan;LIU Xianghuai;ZOU Shichang Ion Beam Laboratory; Shanghai Institute of Metallurgy; Academia Sinica. COMPUTER SIMULATION OF ION BEAM ENHANCED DEPOSITION OF TiN FILMS[J]. 金属学报, 1991, 27(3): 136-141. [10] LI Shizhi;XU Xiang Qingdao Institute of Chemical Technology; Qingdao; ShandongProfessor;Thin Solid Films Lab.;Qingdao Institute of Chemical Technology;53 Zhengzhou Road; Qingdao; Shandong. PLASMA CHEMICAL VAPOR DEPOSITED TiN FILMS[J]. 金属学报, 1988, 24(3): 229-235. No Suggested Reading articles found! Viewed Full text Abstract Cited   Shared      Discussed