金属学报  1998, Vol. 34 Issue (8): 892-896

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Cu在Pt(111)面上电结晶的成膜过程研究

印仁和;曹为民;施文广;孙洁林;毛秉伟;孙世刚

上海大学化学系;上海嘉定;201800;上海大学化学系;上海嘉定;201800;上海大学化学系;上海嘉定;201800;中国科学院原子核研究所;上海嘉定;201800;厦门大学固体表面物理化学国家重点实验室;厦门;361005;厦门大学固体表面物理化学国家重点实验室;厦门;361005

STUDY ON THE PROCESS OF COPPER ELECTRODEPOSITION ON PLATINUM (111)

YIN Renhe; CAO Weimin; SHI Wenguang(Department of Chemistry; Shanghai University; Shanghai 201800)SUN Jielin(Institute of Nuclear Research; The Chinese Academy of Sciences; Shanghai 201800)MAO Bingwei; SUN Shigang(State Key Laboratory for Physics Chemistry of the Solid Surface; Xiamen University; Xiamen 361005)Correspondent: YIN Renhe; associate profsson Tel: (021)59532932-272; Fax: (021)59529932;E-mail: papayaly online. sh. ch

印仁和;曹为民;施文广;孙洁林;毛秉伟;孙世刚. Cu在Pt(111)面上电结晶的成膜过程研究[J]. 金属学报, 1998, 34(8): 892-896.
, , , , , . STUDY ON THE PROCESS OF COPPER ELECTRODEPOSITION ON PLATINUM (111)[J]. Acta Metall Sin, 1998, 34(8): 892-896.

摘要 参考文献 相关文章 Metrics 全文: PDF(1781 KB)   摘要: 采用0．001mol／LCuSO4＋0．5mol／LH2SO4溶液体系，在Pt单晶球电极作循环伏安曲线，得到Cu存在欠电位沉积和本体沉积两个阶段，利用电化学扫描隧道显微镜观察到在欠电位下Cu在Pt（111）面上为单层平面生长，本体沉积为三维岛状生长，并随过电位升高，Cu的成核数目增加．用反射电子显微镜法也观察到高过电位时在Pt（111）面上的岛状铜．证实了Cu在Pt（111）面上的Stranski—Krastanov生长机理 关键词 ： 欠电位沉积,  电化学扫描隧道显微镜,  反射电子显微镜,  Stranski—Krastanov生长机理     Abstract：C-V curves of copper electrodeposition on Pt(111) showed that there were two stages of underpotential and bulk deposition for copper electrodeposition process. Single layer growth at underpotential deposition and three dimensional nucleation growth at bulk deposition had been in situ observed by electrochemical scanning tunneling microscopy (ECSTM) at different potentials and times. The reflection electron microscopy (REM) images also revealed three dimensional growth of Cu deposition at high overpotential. All of these results demonstrated Stranski-Krastanov growth mechanism of copper on Pt(111). Key words： underpotential deposition    ECSTM    REM    Stranski-Krastanov growth mechanism 收稿日期: 1998-08-18      基金资助:国家自然科学基金!59471060;;厦门大学固体表面物理化学国家重点实验室、中国科学院原子核分析研究室资助 服务 把本文推荐给朋友 加入引用管理器 E-mail Alert RSS 作者相关文章 印仁和 曹为民 施文广 孙洁林 毛秉伟 孙世刚 44.8K 链接本文: https://www.ams.org.cn/CN/      或      https://www.ams.org.cn/CN/Y1998/V34/I8/892 1印仁和,曹为民,郭也平,计慧芬,周天健,秦勇,王葛亚.电化学,1997;3:252 (Yin R H, Cao W M, Guo Y P, Ji H F, Zhou T J, Qin Y, Wang G Y. Electrochemistry; 1997; 3: 252) 2Batina N, will T, Kolb D M. Faraday Discuss Chem Soc, 1992; 94: 93 3谢兆雄,毛秉伟,卓向东,穆纪千,田昭武.电化学,1996; 2:164 (Xi Z X, Mao B W, Zhuo X D, Mu J Q, Tian Z W. Electrochemistry 1996; 2: 164) 4常光幸矣,林安德.日本金属学会会报,1992;31:849 (Jyoko Y,hayashi Y.Bull Jpn Inst Met,1992; 31:849 5 Azgile C,Rhead G E.Surf Sci Rep,1989;10:277 6李宗全.物理,1989;18:715(Li Z Q. Physics, 1989; 18: 715) No related articles found! Viewed Full text Abstract Cited   Shared      Discussed