| 
					引用本文:
						|  |  
    					|  |  
    					| (Fe,Co,Ni)-P系合金电化学沉积条件与结构的关系 |  
						| 姜晓霞;张弦;林树智 |  
					| 中国科学院金属研究所;中国科学院金属研究所;中国科学院金属研究所 |  
						|  |  
    					| CORRELATION BETWEEN STRUCTURE OF ELECTROCHEMICALLY DEPOSITED (Fe,Co,Ni)-P LAYERS AND PROCESS CONDITIONS |  
						| JIANG Xiaoxia; ZHANG Xuan; LIN Shuzhi (Institute of Metal Research; Academia Sinica; Shenyang) |  
								姜晓霞;张弦;林树智. (Fe,Co,Ni)-P系合金电化学沉积条件与结构的关系[J]. 金属学报, 1986, 22(2): 124-133.	
																												,
																								 ,
																												 . 
				CORRELATION BETWEEN STRUCTURE OF ELECTROCHEMICALLY DEPOSITED (Fe,Co,Ni)-P LAYERS AND PROCESS CONDITIONS[J]. Acta Metall Sin, 1986, 22(2): 124-133.
 
					
						| 
								
									|  
          
          
            
                         
            
									            
									                
																														  
																| 1 石桥知;鹰野修;青木公二,金属表面技术,21 (1970) ,541;31 (1980) ,28. 2 Brenner, A., J. Res. Nat. Bur. Stand., 44 (1950) , 109.
 3 增井宽二,日本金属学会誌,41 (1977) ,1130.
 4 #12
 5 #12
 6 云南省交通科学研究所,镀铁电镀液研究,1970.
 7 武汉锅炉厂403车间,防腐包装,1979.
 8 渡(刀辶)徹,金属表面技术,32 (1981) ,601.
 9 吉岡正三,金属表面技术,20 (1961) ,172.
 10 林树智;黑祖昆,物理学报,33 (1984) ,302.
 11 Dixmier, J.; Gunier, A., Rev, Metall,, (Paris), 64 (1967) , 53.[
 |  
             
												
											    	
											        	|  | Viewed |  
											        	|  |  |  
												        |  | Full text 
 | 
 
 |  
												        |  |  |  
												        |  | Abstract 
 | 
 |  
												        |  |  |  
												        |  | Cited |  |  
												        |  |  |  |  
													    |  | Shared |  |  
													    |  |  |  |  
													    |  | Discussed |  |  |  |  |