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(Fe,Co,Ni)-P系合金电化学沉积条件与结构的关系 |
姜晓霞;张弦;林树智 |
中国科学院金属研究所;中国科学院金属研究所;中国科学院金属研究所 |
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CORRELATION BETWEEN STRUCTURE OF ELECTROCHEMICALLY DEPOSITED (Fe,Co,Ni)-P LAYERS AND PROCESS CONDITIONS |
JIANG Xiaoxia; ZHANG Xuan; LIN Shuzhi (Institute of Metal Research; Academia Sinica; Shenyang) |
引用本文:
姜晓霞;张弦;林树智. (Fe,Co,Ni)-P系合金电化学沉积条件与结构的关系[J]. 金属学报, 1986, 22(2): 124-133.
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CORRELATION BETWEEN STRUCTURE OF ELECTROCHEMICALLY DEPOSITED (Fe,Co,Ni)-P LAYERS AND PROCESS CONDITIONS[J]. Acta Metall Sin, 1986, 22(2): 124-133.
1 石桥知;鹰野修;青木公二,金属表面技术,21 (1970) ,541;31 (1980) ,28. 2 Brenner, A., J. Res. Nat. Bur. Stand., 44 (1950) , 109. 3 增井宽二,日本金属学会誌,41 (1977) ,1130. 4 #12 5 #12 6 云南省交通科学研究所,镀铁电镀液研究,1970. 7 武汉锅炉厂403车间,防腐包装,1979. 8 渡(刀辶)徹,金属表面技术,32 (1981) ,601. 9 吉岡正三,金属表面技术,20 (1961) ,172. 10 林树智;黑祖昆,物理学报,33 (1984) ,302. 11 Dixmier, J.; Gunier, A., Rev, Metall,, (Paris), 64 (1967) , 53.[ |
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