|
|
脉冲高能量密度等离子体沉积氮化钛膜的结合强度 |
阎鹏勋;杨思泽;陈熙琛 |
中国科学院物理研究所 |
|
ADHESIVE STRENGTH OF TiN COATING DEPOSITED BY PULSED HIGH ENERGY DENSITY PLASMA |
YAN Pengxun; YANG Size; CHEN Xishen (Institute of physics; Chinese Academy of Sciences; Beijing)(Manuscript received 3 May; 1994;in revised form 28 July; 1994) |
引用本文:
阎鹏勋;杨思泽;陈熙琛. 脉冲高能量密度等离子体沉积氮化钛膜的结合强度[J]. 金属学报, 1994, 30(23): 503-507.
,
,
.
ADHESIVE STRENGTH OF TiN COATING DEPOSITED BY PULSED HIGH ENERGY DENSITY PLASMA[J]. Acta Metall Sin, 1994, 30(23): 503-507.
1BhardwajP,GregoryOJ,BraggaK.ApplSurfSci,1991;48//49:5552PrechtW,StermaF.Vacuum,1990;41:22233郭丽萍,黄荣芳,闻立时,庄育智.真空科学与技术,1993;13:3224阎鹏勋,吴宝善.机械工程材料,1992;16(4):725王曦,柳襄怀,郑志宏,黄巍,邹世昌.应用科学学报,1992;10:956白鹏勋,杨恩泽,李兵,陈熙琛.科学通报,(正在印刷)1994;397李兵,刘赤子,杨思泽,吴成,卢伟,沈志刚,任育峰,汪诗金,阎鹏勋.高能量密度等离子体枪及表面改性实验研究,中国科学院物理研究所内部资料,19928BenjaminP,WeaverC.ProcRSocLondon,1960;A254:163 |
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
|
Shared |
|
|
|
|
|
Discussed |
|
|
|
|