Ti(C,N)薄膜的复合硬度与本征硬度的研究

金属学报

1995, Vol. 31

Issue (21): 429-434

论文

本期目录 | 过刊浏览

Ti(C,N)薄膜的复合硬度与本征硬度的研究

徐可为;白辰东;何家文

西安交通大学金属材料强度国家重点实验室

ON THE COMPOSITE AND INTRINSIC HARDNESS OF Ti(C, N) FILMS

XU Kewei; BAI Chendong; HE Jiawen (State Key; Laboratory for Mechanical Behaviour of Materials; Hi'an Jiaotong University;Xi'an 710049)(Manuscript received 1994-08-23; in revised form 1995-01-26)

引用本文:

徐可为;白辰东;何家文. Ti(C,N)薄膜的复合硬度与本征硬度的研究[J]. 金属学报, 1995, 31(21): 429-434.
, , . ON THE COMPOSITE AND INTRINSIC HARDNESS OF Ti(C, N) FILMS[J]. Acta Metall Sin, 1995, 31(21): 429-434.

全文: PDF(429 KB)

摘要: 本文对不同性质的膜─基体系通过确定Ｃ的具体取值对Ｊｏｅｎｓｓｏｎ－Ｈｏｇｍａｒｋ模型予以修正，研究厂等离子体增强化学气相沉积Ｔｉ（Ｃ，Ｎ）薄膜的硬度及其随成分组织的变化。Ｔｉ（Ｃ、Ｎ）薄膜具有较小的晶粒尺寸和较高的残余压应力，其硬度远高于一般的整体材料，在确定的。工艺条件下，其值上要取决于膜的含碳量，大体成线性增加关系。

关键词 ：Ｔｉ（Ｃ, Ｎ）薄膜, 复合硬皮, 本征硬度

Abstract：The model proposed by Joensson and Hogmark takes the parameter, C, as a constant for different film-substrate systems. The parameter was modified in the present paper according to different hardness ratio of film to substrate and used them to study the variation of the hardness of PCVD Ti(C, N) films with the composition and the microstructure.Comparing with bulk materials, Ti(C, N) films have a relative high hardness due to the smaller crystal size and the higher compressive residual stress. It is controlled by the carbon content and hold a linear increase with the carbon content for a definite deposition technique.Correspondent:(XU Kewei, professor, Hi'an Jiaotong University, Hi'an 710049)

Key words： Ti(C N) film composite hardness intrinsic hardness

基金资助:国家自然科学基金

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