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Seemann-Bohlin X射线薄膜衍射装置的强度分析 |
陶琨;董志力;陈顺英;王并举 |
清华大学材料科学研究所;清华大学材料科学研究所;清华大学材料科学研究所;清华大学材料科学研究所 |
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DIFFRACTION INTENSITY OF SEEMANNBOHLIN X-RAY DIFFRACTION ATTACHMENT FOR THIN FILM ANALYSIS |
by TAO Kun; DONG Zhili; CHEN Shunying; WANG Bingju (Institute of Materials Science; Tsinghua University; Beijing)(Manuscript recived 23 August; 1985; revised manuscript 7 March; 1987) |
引用本文:
陶琨;董志力;陈顺英;王并举. Seemann-Bohlin X射线薄膜衍射装置的强度分析[J]. 金属学报, 1987, 23(5): 486-491.
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DIFFRACTION INTENSITY OF SEEMANNBOHLIN X-RAY DIFFRACTION ATTACHMENT FOR THIN FILM ANALYSIS[J]. Acta Metall Sin, 1987, 23(5): 486-491.
1 Rigaku Corporation. The Rigaku Journal, 1984; 1 (2) : 22 2 Mack M, Parrish W. Acta Crystallogr, 1967: 23: 693 3 范雄.X射线金属学,机械工业出版社,1981:51 |
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