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金属学报  1987, Vol. 23 Issue (5): 486-491    
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Seemann-Bohlin X射线薄膜衍射装置的强度分析
陶琨;董志力;陈顺英;王并举
清华大学材料科学研究所;清华大学材料科学研究所;清华大学材料科学研究所;清华大学材料科学研究所
DIFFRACTION INTENSITY OF SEEMANNBOHLIN X-RAY DIFFRACTION ATTACHMENT FOR THIN FILM ANALYSIS
by TAO Kun; DONG Zhili; CHEN Shunying; WANG Bingju (Institute of Materials Science; Tsinghua University; Beijing)(Manuscript recived 23 August; 1985; revised manuscript 7 March; 1987)
引用本文:

陶琨;董志力;陈顺英;王并举. Seemann-Bohlin X射线薄膜衍射装置的强度分析[J]. 金属学报, 1987, 23(5): 486-491.
, , , . DIFFRACTION INTENSITY OF SEEMANNBOHLIN X-RAY DIFFRACTION ATTACHMENT FOR THIN FILM ANALYSIS[J]. Acta Metall Sin, 1987, 23(5): 486-491.

全文: PDF(379 KB)  
摘要: 研制了无前单色器Seemann-Bohlin掠射聚焦装置,并对Seemann-Bohlin法的衍射强度公式进行了讨论.计算表明:1.此装置测定表面层及薄膜的衍射强度约为普通衍射仪法的7—20倍。用1kW的X射线源即可快速测得7nm金膜的2θ<120.的衍射线.2.厚样品的衍射强度也可达一般衍射仪法的3—20倍.实验证实了这个结果.
Abstract:A Seemann-Bohlin X-ray diffraction attachment for thin film analysis has been developed and the" diffraction intensity of it has also been discussed. The results of calculation show that: (1) The diffraction intensity for solid surface or thin film analyzed by this attachment is 7—20 times as high as that by ordinary diffractometer. For example, to analyse a Au film of 7nm thickness using a 1 kW X-ray source, a fairly good diffraction pattern was obtained up to 2θ=120° with the scanning speed of 4° (2θ)/min. (2) It can also be used for determining of thick polycrystalline samples. In this case, its diffraction intensity is 3—20 times as high as that of ordinary diffractometer. These conclusions were confirmed by experimental results.
收稿日期: 1987-05-18     
1 Rigaku Corporation. The Rigaku Journal, 1984; 1 (2) : 22
2 Mack M, Parrish W. Acta Crystallogr, 1967: 23: 693
3 范雄.X射线金属学,机械工业出版社,1981:51
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