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    					| Seemann-Bohlin X射线薄膜衍射装置的强度分析 | 
  					 
  					  										
						| 陶琨;董志力;陈顺英;王并举 | 
					 
															
					| 清华大学材料科学研究所;清华大学材料科学研究所;清华大学材料科学研究所;清华大学材料科学研究所 | 
					 
										
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    					| DIFFRACTION INTENSITY OF SEEMANNBOHLIN X-RAY DIFFRACTION ATTACHMENT FOR THIN FILM ANALYSIS | 
  					 
  					  					  					
						| by TAO Kun; DONG Zhili; CHEN Shunying; WANG Bingju (Institute of Materials Science; Tsinghua University; Beijing)(Manuscript recived 23 August; 1985; revised manuscript 7 March; 1987) | 
					 
														 
				
				引用本文: 
				
								陶琨;董志力;陈顺英;王并举. Seemann-Bohlin X射线薄膜衍射装置的强度分析[J]. 金属学报, 1987, 23(5): 486-491.	
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				DIFFRACTION INTENSITY OF SEEMANNBOHLIN X-RAY DIFFRACTION ATTACHMENT FOR THIN FILM ANALYSIS[J]. Acta Metall Sin, 1987, 23(5): 486-491.	                                                        				  
				
				
					
						
							
								
									
									
									
									
									 
          
          
            
                         
            
									            
									                
																														  
																   1 Rigaku Corporation. The Rigaku Journal, 1984; 1 (2) : 22 2 Mack M, Parrish W. Acta Crystallogr, 1967: 23: 693 3 范雄.X射线金属学,机械工业出版社,1981:51 | 
															   
																													 
									             
									           
             
			            			 
			 
             
												
											    	
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