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金属学报  1986, Vol. 22 Issue (3): 26-32    
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Ta中氢化物沉淀过程的内耗研究
李广义;潘正良;王晓伟;肖金泉
中国科学院金属研究所;中国科学院金属研究所;中国科学院金属研究所;中国科学院金属研究所
INTERNAL FRICTION OF HYDRIDE PRECIPITATION IN Ta-H ALLOYS
by LI Guangyi; PAN Zhengliang; WANG Xiaowei; XIAO Jinquan (Institute of Metal Research; Academia Sinica; Shenyang)
引用本文:

李广义;潘正良;王晓伟;肖金泉. Ta中氢化物沉淀过程的内耗研究[J]. 金属学报, 1986, 22(3): 26-32.
, , , . INTERNAL FRICTION OF HYDRIDE PRECIPITATION IN Ta-H ALLOYS[J]. Acta Metall Sin, 1986, 22(3): 26-32.

全文: PDF(550 KB)  
摘要: 测量了冷加工的高纯Ta丝在电解加氢前后的低频内耗。发现在加氢后除出现氢化物沉淀峰外,氢一位错交互作用的内耗峰也降低,附加范性扭形变对沉淀峰有明显的增强作用;在氧原子可动的温度范围内时效,可以完全消除形变对沉淀峰的增强作用。结果表明,氢化物可能择优在位错上沉淀。沉淀峰的本质可能与位错-氢化物交互作用有关。
Abstract:The low frequency internal friction of the cold-worked Ta wire with high purity was measured before and after hydrogen charging. It showed that a precipitation peak appears at higher temperature than that of H-SK peak, and at same time the latter is decreased in its height after charging. An additional twist shows remarkable influence on the precipitation peak. Aging at the temperature in which O atoms are able to migrate to the dislocations might completely eliminate the enhancement effect. The results indicate that the hydrides might preferentially precipitate on the dislocations. The precipitation peak is considered to be associated with the interaction between the dislocations and the hydrides.
收稿日期: 1986-03-18     
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