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Nd含量对磁控溅射Si(111)/Cr/Nd-Co/Cr薄膜结构与磁性的影响 |
何贤美1,童六牛2(),高成2,王毅超2 |
1. 安徽工业大学数理科学与工程学院 马鞍山 243002 2. 安徽工业大学材料科学与工程学院 马鞍山 243002 |
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Effect of Nd Content on the Structure and Magnetic Properties of Si(111)/Cr/Nd-Co/Cr Thin Films Prepared by Magnetron Sputtering |
HE Xianmei1,TONG Liuniu2(),GAO Cheng2,WANG Yichao2 |
1. School of Mathematics and Physics, Anhui University of Technology, Ma'anshan 243002, China 2. School of Materials Science and Engineering, Anhui University of Technology, Ma'anshan 243002, China |
引用本文:
何贤美, 童六牛, 高成, 王毅超. Nd含量对磁控溅射Si(111)/Cr/Nd-Co/Cr薄膜结构与磁性的影响[J]. 金属学报, 2019, 55(10): 1349-1358.
Xianmei HE,
Liuniu TONG,
Cheng GAO,
Yichao WANG.
Effect of Nd Content on the Structure and Magnetic Properties of Si(111)/Cr/Nd-Co/Cr Thin Films Prepared by Magnetron Sputtering[J]. Acta Metall Sin, 2019, 55(10): 1349-1358.
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