Received date: 2010-01-08
Revised date: 2010-04-17
Online published: 2010-07-11
Supported by
Supported by Science Innovation Foundation of Institute of Electronic Engineering of China Academy of Engineering Physics (No.S20090801)
Effect of the D+ ion beam on Ti film is studied by radiating the Ti films with different energy D+ beams on electrostatic accelerator. Slow positron annihilation spectroscopy and SEM are used to characterize the films. With the D+ beam energy increases, the extent of radiation damage and the surface ablation of Ti films increase. The maximum of radiation damage locates at 0.3 μm depth. The geometrical non-uniformity on original surface is the main reason for the ablation behavior on Ti films by inducing a selective ablation under radiation. Radiation damage and energy loss of D+ in Ti film are discussed in detail by the numerical simulation of the beam and the solid interaction. It shows that the maximum radiation damage is at 0.65 $\mu$m depth and energy loss of D+ beam in Ti films accords with the experimental observation.
Key words： D+; Ti film; slow positron annihilation spectroscopy
YU Bo-Yu , XIANG Wei . EFFECT OF D+ BEAM IRRADIATION ON Ti FILM[J]. Acta Metall Sin, 2010 , 46(7) : 810 -813 . DOI: 10.3724/SP.J.1037.2010.00017
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