A HRTEM study on a modulation structure in NiAl3 after ion etching

Acta Metall Sin

2008, Vol. 44

Issue (10): 1153-1156 DOI:

Research Articles

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A HRTEM study on a modulation structure in NiAl3 after ion etching

;Rong Wang

北京科技大学

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Rong Wang. A HRTEM study on a modulation structure in NiAl3 after ion etching. Acta Metall Sin, 2008, 44(10): 1153-1156 .

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Abstract A one-dimensional incommensurate modulation structure was observed in NiAl3 after 3 keV Ar+ ion etching and studied by image deconvolution in HRTEM. The structure is proposed to be a type of compositional modulations.

Key words: modulation structure NiAl3 ion etching HRTEM image processing

Received: 22 May 2008

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