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Cr-O-N FILMS DEPOSITED BY ARC ION PLATING AS ACTIVE DIFFUSION BARRIERS |
WANG Qimin; GUO Minghu; KE Peiling; SUN Chao; HUANG Rongfang; WEN Lishi |
State Key Laboratory for Corrosion and Protection; Institute of Metal Research; |
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Cite this article:
WANG Qimin; GUO Minghu; KE Peiling; SUN Chao; HUANG Rongfang; WEN Lishi. Cr-O-N FILMS DEPOSITED BY ARC ION PLATING AS ACTIVE DIFFUSION BARRIERS. Acta Metall Sin, 2004, 40(12): 1264-1268 .
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Abstract Cr-O-N films with different chemical composition were deposited using
arc ion plating (AIP) between NiCoCrAlY coatings and the DSM11 substrate
as diffusion barriers. The inhibition effects of the diffusion barriers
on the interdiffusion of the alloy elements in the
DSM11/Cr-O-N/NiCoCrAlY system were studied after exposured at 900 ℃
for 1400 h. The influences of the barriers on the oxidation kinetics
were also investigated. The results indicate that the Cr-O-N layers
can change into Al-rich oxide layers with active bonding with the coatings
and the substrates during the high temperature exposure. The Al-rich
oxide layers hindered the interdiffusion of the alloying elements between
DSM11 substrate and NiCoCrAlY coating. Thus the Cr-O-N layers can act as
active diffusion barrier. The O and N compositions in the Cr-O-N
layer affect the continuity and density of the Al--rich oxide layers,
and influence the inhibition effect of the diffusion barriers accordingly.
All the Cr-O-N barriers decreased the weight gain of the NiCoCrAlY
coatings at 900 ℃. The improvement extent of the Cr-O-N barriers on the
oxidation behavior of the NiCoCrAlY coatings is corresponding with the
inhibition capacity of the barriers.
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Received: 22 October 2003
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