Acta Metall Sin  1987, Vol. 23 Issue (3): 288-290    DOI:

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THERMAL STABILITY OF AMORPHOUS Fe-Co-Si-B THIN FILM PREPARED BY SPUTTERING

FENG Qun; FENG Minying; WANG Yizhong; WANG Zhenxi(Institute of Physics; Academia Sinica; Beijing) (Manuscript received 16 August; 1985; revised manuscript 6 May; 1986)

FENG Qun; FENG Minying; WANG Yizhong; WANG Zhenxi(Institute of Physics; Academia Sinica; Beijing) (Manuscript received 16 August; 1985; revised manuscript 6 May; 1986). THERMAL STABILITY OF AMORPHOUS Fe-Co-Si-B THIN FILM PREPARED BY SPUTTERING. Acta Metall Sin, 1987, 23(3): 288-290.

Abstract References Related Articles Recommended Metrics Download:  PDF(800KB)  Export:  BibTeX | EndNote (RIS)       Abstract  The thermal stability of amorphous Fe_78Co_4.3Si_5.9B_11.8 thin film prepared by sputtering has been studied using thermomagnatie measurements, differential thermal analysis, electron microscopic analysis, electron diffraction and X-ray diffraction. It is observed that the crys-tallization process of sputtering film is different from that of melt quenching ribbons. The crystallization temperature of the former is much lower than that of latter. The preparing condition have an important effect on the thermal stability. Received:  18 March 1987      Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors URL:  https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y1987/V23/I3/288 1 Egami T, Dahlgren S D, J Appl Phys, 1978; 49: 1703 2 Tsumashima S, Mitruya S, uchiyama S. Jpn J Appl Phys, 1981; 20: 727 3 Herold U, Koster U, Dirks A G. J Magn Magn Mater, 1980; 19: 15 No related articles found! No Suggested Reading articles found! Viewed Full text Abstract Cited   Shared      Discussed