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STRUCTURE AND PROPERTIES OF Fe-Dy MULTILAYER IMPLANTED WITH Ar~(+) |
LI Shengli;WANG Peixuan (University of Scicnce and Technology Beijing); YAN Fengzhang (Beijing Normal University); MA Ruzhang(University of Science and Technology Beijing)(Manuscript received 28 April;1993) |
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Cite this article:
LI Shengli;WANG Peixuan (University of Scicnce and Technology Beijing); YAN Fengzhang (Beijing Normal University); MA Ruzhang(University of Science and Technology Beijing)(Manuscript received 28 April;1993). STRUCTURE AND PROPERTIES OF Fe-Dy MULTILAYER IMPLANTED WITH Ar~(+). Acta Metall Sin, 1994, 30(4): 160-163.
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Abstract Compositionally modulated Fe-Dy films were prepared by alternate evaporation of the two elements onto Si single crystal substrates. Atomic ratio (Fe:Dy) of the film is about 3: 2. Auger electron spectrometry (AES), Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD), and measurements of magnetic properties were used to study the changes of the films after Ar ion beam mixing.The ion energy and the dose range were 110 keV and 5×10~15-1×10~(17)cm~(-2); respectively. It was found that, complete mixing of the films can be achieved at an ion fluence of1×10~(17)cm~(-2). At this point, the films transformed from a mixture of crystals to an amorphous alloy completely. The saturation magnetization M_s of the films decreases after ion beam mixing. In particular, M_s drops sharply for the ion fluences being equal to or less than 5 × 10~15 cm~-2.Correspondent: WANG Peixuan, professor,Department of Material Physics, University of Seience and Taohnology Beijing, Beijing 100083
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Received: 18 April 1994
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