Please wait a minute...
金属学报  1987, Vol. 23 Issue (3): 288-290    
  论文 本期目录 | 过刊浏览 |
Fe-Co-Si-B非晶态溅射薄膜的热稳定性
冯群;冯敏英;王亦忠;王震西
中国科学院物理研究所;中国科学院物理研究所;中国科学院物理研究所;中国科学院物理研究所
THERMAL STABILITY OF AMORPHOUS Fe-Co-Si-B THIN FILM PREPARED BY SPUTTERING
FENG Qun; FENG Minying; WANG Yizhong; WANG Zhenxi(Institute of Physics; Academia Sinica; Beijing) (Manuscript received 16 August; 1985; revised manuscript 6 May; 1986)
引用本文:

冯群;冯敏英;王亦忠;王震西. Fe-Co-Si-B非晶态溅射薄膜的热稳定性[J]. 金属学报, 1987, 23(3): 288-290.
, , , . THERMAL STABILITY OF AMORPHOUS Fe-Co-Si-B THIN FILM PREPARED BY SPUTTERING[J]. Acta Metall Sin, 1987, 23(3): 288-290.

全文: PDF(800 KB)  
摘要: <正> Egami等曾提出Fe_(80)B_(20)溅射合金的T_(Cr)比同成分液淬合金高50K;Tsumashima等则报道Fe基溅射薄膜的T(Cr)比液淬合金略低或相等,Herold等用电镜方法研究了蒸发FeB合
Abstract:The thermal stability of amorphous Fe_78Co_4.3Si_5.9B_11.8 thin film prepared by sputtering has been studied using thermomagnatie measurements, differential thermal analysis, electron microscopic analysis, electron diffraction and X-ray diffraction. It is observed that the crys-tallization process of sputtering film is different from that of melt quenching ribbons. The crystallization temperature of the former is much lower than that of latter. The preparing condition have an important effect on the thermal stability.
收稿日期: 1987-03-18     
1 Egami T, Dahlgren S D, J Appl Phys, 1978; 49: 1703
2 Tsumashima S, Mitruya S, uchiyama S. Jpn J Appl Phys, 1981; 20: 727
3 Herold U, Koster U, Dirks A G. J Magn Magn Mater, 1980; 19: 15
No related articles found!