金属学报  1987, Vol. 23 Issue (2): 162-164

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In清洁表面氧吸附及早期氧化的CLS和AES研究

戴道宣;朱福荣

复旦大学表面物理实验室;复旦大学表面物理实验室

CLS AND AES STUDIES OF OXYGEN ADSORPTION AND INITIAL OXIDATION ON CLEAN In SURFACE

DAI Daoxuan; ZHU Furong (Surface Physics Laboratory; Fudan University. Shanghai) (Manuscript received 4 January. 1985; revised manuscript 10 June. 1986)

戴道宣;朱福荣. In清洁表面氧吸附及早期氧化的CLS和AES研究[J]. 金属学报, 1987, 23(2): 162-164.
, . CLS AND AES STUDIES OF OXYGEN ADSORPTION AND INITIAL OXIDATION ON CLEAN In SURFACE[J]. Acta Metall Sin, 1987, 23(2): 162-164.

摘要 参考文献 相关文章 Metrics 全文: PDF(245 KB)   摘要: <正> 近年来对Al的氧吸附和氧化已有大量研究,相比之下,对较重的三价金属In的氧吸附研究甚少.本文用CLS(特征能量损失谱)和AES(Auger电子谱)研究了氧在In表面的吸附及氧化.实验在ESCALAB-5型电子谱仪上进行. Abstract：The adsorption of oxygen and initial stages of oxidation on clean In surface were studied using CLS and AES. It was observed that the oxygen was already absorbed on the surface at low oxygen exposure down to 10~(-2)LO_2. A monolayer oxide on In can be found at exposure of 10~2LO_2 and a continuous metal free thicker oxide layer at 10~3LO_2, then a fast adsorption stage is followed by a slower one after 10~3LO_2 收稿日期: 1987-02-18      服务 把本文推荐给朋友 加入引用管理器 E-mail Alert RSS 作者相关文章 戴道宣 朱福荣 44.8K 链接本文: https://www.ams.org.cn/CN/      或      https://www.ams.org.cn/CN/Y1987/V23/I2/162 Aden E H, Seymour D L, Pattinson E B. Surf Sci 1984; 141: 1 2 Wilmson C W, Kee R W. J Vac Sci Technol 1977; 14: 953 3 Ohnson O J. Chem Scr 1975; 8: 162 4 Tu C W, Schlier A R. Appl Surf Sci 1982; 11/12: 355 5 Bevolo A J, Derhvever JD, Nvack M. Sur Sci 1983; 134: 49 No related articles found! Viewed Full text Abstract Cited   Shared      Discussed