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金属学报  1986, Vol. 22 Issue (6): 133-155    
  论文 本期目录 | 过刊浏览 |
金属玻璃Pd_(80)Si_(20)的氧化对热稳定性的影响
李宗全;戚震中;何怡贞
中国科学院固体物理研究所;中国科学院固体物理研究所;中国科学院固体物理研究所
EFFECT OF SURFACE OXIDATION ON THERMAL STABILITY OF AMORPHOUS Pd_(80)Si_(20)
by LI Zongquan; QI Zhenzhong; HE Yizhen (Institute of Solid Physics; Academia Sinica; Hefei)
引用本文:

李宗全;戚震中;何怡贞. 金属玻璃Pd_(80)Si_(20)的氧化对热稳定性的影响[J]. 金属学报, 1986, 22(6): 133-155.
, , . EFFECT OF SURFACE OXIDATION ON THERMAL STABILITY OF AMORPHOUS Pd_(80)Si_(20)[J]. Acta Metall Sin, 1986, 22(6): 133-155.

全文: PDF(2016 KB)  
摘要: <正> 本工作是在电子显微镜内原位加热的同时,观察α-Pd_(80)Si_(20)的氧化过程及其对晶化的影响。 用双喷制备的试样安装在JEM-200CX电子显微镜的加热台上,以不同的速度进行加热,并对氧化过程进行原位观察。试样室的真空度保持在~10~(-5)Pa,然后将原位观察过的试样,在Auger谱仪中用Ar~+离子对试样表面逐层剥离,以分析成分随深度的变化。为了对比,试样也在Auger谱仪中(真空度~10~(-7)Pa)进行加热,观察表面层成分随温度的变化。
Abstract:Surface oxidation of amorphous Pd_(80)Si_(20) was studied by in situ observation in JEOL-200CX electron microscope under vacuum about 10~(-5) Pa and AES. An amorphous oxide layer formed evidently on the surface of the α-Pd_(80)Si_(20) specimen at a temperature around 120℃. During heating, owing to the inward movement of Si-atoms and surface oxidation, the Si content along the edge of a wedge specimen and on the surface layers of the matrix increased, and therefore made the thermal stability decreased.
收稿日期: 1986-06-18     
1 李宗全;何怡贞,科学通报,30 (1985) ,1859。
2 Funakoshi, N.; Kanamori. T.; Manabe. T., Jpn J. Appl. Phys., 17 (1978) , 11.n
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