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Numerical Analysis Of Spacial Field In Hot Filament Chemical Vapor Deposition Diamond Film |
LI Jianguo; LIU Shi; LI Yiyi;HU Dongping; JI Xilin; MEI Jun;ZHOU Dehui |
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Cite this article:
LI Jianguo; LIU Shi; LI Yiyi; HU Dongping; JI Xilin; MEI Jun; ZHOU Dehui. Numerical Analysis Of Spacial Field In Hot Filament Chemical Vapor Deposition Diamond Film. Acta Metall Sin, 2005, 41(4): 437-443 .
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Abstract Two--dimension coupled model of the temperature filed, velocity field
and density field was developed according to the geometry and technology
parameters in hot filament chemical vapor deposition (HFCVD) diamond
film. The spacial field during large area diamond film deposition was
simulated using this model to study the influence of deposited parameters.
The calculated results about the temperature
and the mass flow density on the substrate are consistent with
experimented ones. The inlet gas velocity obviously affects the uniformity
of the mass flow density, and the other deposited parameters have
little influence on the distributions of the temperature and mass flow density.
The optimal hot filament geometry parameters to deposit high quality
diamond films with an area of 100mmx100 mm are
gained on the basis of the minimum temperature along hot filament array.
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Received: 27 May 2004
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