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| CLS AND AES STUDIES OF OXYGEN ADSORPTION AND INITIAL OXIDATION ON CLEAN In SURFACE |
| DAI Daoxuan; ZHU Furong (Surface Physics Laboratory; Fudan University. Shanghai) (Manuscript received 4 January. 1985; revised manuscript 10 June. 1986) |
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Cite this article:
DAI Daoxuan; ZHU Furong (Surface Physics Laboratory; Fudan University. Shanghai) (Manuscript received 4 January. 1985; revised manuscript 10 June. 1986). CLS AND AES STUDIES OF OXYGEN ADSORPTION AND INITIAL OXIDATION ON CLEAN In SURFACE. Acta Metall Sin, 1987, 23(2): 162-164.
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Abstract The adsorption of oxygen and initial stages of oxidation on clean In surface were studied using CLS and AES. It was observed that the oxygen was already absorbed on the surface at low oxygen exposure down to 10~(-2)LO_2. A monolayer oxide on In can be found at exposure of 10~2LO_2 and a continuous metal free thicker oxide layer at 10~3LO_2, then a fast adsorption stage is followed by a slower one after 10~3LO_2
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Received: 18 February 1987
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Aden E H, Seymour D L, Pattinson E B. Surf Sci 1984; 141: 1
2 Wilmson C W, Kee R W. J Vac Sci Technol 1977; 14: 953
3 Ohnson O J. Chem Scr 1975; 8: 162
4 Tu C W, Schlier A R. Appl Surf Sci 1982; 11/12: 355
5 Bevolo A J, Derhvever JD, Nvack M. Sur Sci 1983; 134: 49 |
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