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ADHESIVE STRENGTH OF TiN COATING DEPOSITED BY PULSED HIGH ENERGY DENSITY PLASMA |
YAN Pengxun; YANG Size; CHEN Xishen (Institute of physics; Chinese Academy of Sciences; Beijing)(Manuscript received 3 May; 1994;in revised form 28 July; 1994) |
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Cite this article:
YAN Pengxun; YANG Size; CHEN Xishen (Institute of physics; Chinese Academy of Sciences; Beijing)(Manuscript received 3 May; 1994;in revised form 28 July; 1994). ADHESIVE STRENGTH OF TiN COATING DEPOSITED BY PULSED HIGH ENERGY DENSITY PLASMA. Acta Metall Sin, 1994, 30(23): 503-507.
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Abstract The quality TiN film was deposited onto GCr15 steel substrate by the pulsed high energy density plasma technique at room temperature. The adhesive strentgh of TiN coating to GCr15 steel substrate has been satisfactorily measured using automatic scratch tester. The critical load with remarkable higher values may be available to characterize theadhesive strength of the coating. The critical load of the TiN coating was revealed to be varied with numbers of pulsed plasma, the discharge voltage between inner and outer electrodes and pressure of working gases. These have been discussed and explained on the theoretical bases. (Correspondent: YAN Fengxun, associate professor, Institute of physics, Chinese Academy of Sciences, Beijing 100080)
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