纳米晶Ta2N涂层在模拟人体环境中的耐蚀性能研究
作者简介 徐 江,男,1973年生,教授,博士
收稿日期: 2017-06-21
网络出版日期: 2017-12-19
基金资助
资助项目 国家自然科学基金项目Nos.51374130和51675267及国家自然科学基金重点项目No.51635004
In Vitro Corrosion Resistance of Ta2N Nanocrystalline Coating in Simulated Body Fluids
Received date: 2017-06-21
Online published: 2017-12-19
Supported by
Supported by National Natural Science Foundation of China (Nos.51374130 and 51675267) and State Key Program of National Natural Science Foundation of China (No.51635004)
为了改善植入钛合金材料在人体环境中耐蚀性能,采用双阴极等离子反应溅射沉积方法,在医用Ti-6Al-4V钛合金表面制备了厚度为40 μm、平均晶粒尺寸为12.8 nm的Ta2N纳米晶涂层。采用纳米压入仪、Vikers压痕仪和划痕仪考察了Ta2N纳米晶涂层的硬度、弹性模量、韧性以及涂层与基体间的结合力。结果表明,Ta2N涂层的硬度和弹性模量分别为(32.1±1.6) GPa和(294.8±4.2) GPa,涂层与基体的结合力为56 N;在压入载荷为0.49~9.8 N下,Vikers压痕表面以及横断面均未观察到微裂纹,反映其具有较高的压痕韧性。采用动电位极化、电化学阻抗谱、恒电位极化和电容测量(Mott-Schottky)等多种电化学表征技术,对Ta2N涂层在Ringer's生理溶液中的电化学腐蚀行为进行了深入研究,并从钝化膜组成、致密性和半导体特性3个方面探讨了涂层的腐蚀防护机理。结果表明,在Ringer's生理溶液中,Ta2N涂层表面形成的钝化膜更加致密,其腐蚀抗力明显优于Ti-6Al-4V合金。XPS分析结果表明,在较低的极化电位下,Ta2N涂层的钝化膜主要由TaOxNy构成,随着外加极化电位的升高,其进一步氧化形成Ta2O5;电容测试结果表明,Ta2N涂层表面所生成的钝化膜具有n型半导体特征,其施主浓度和载流子扩散系数明显低于Ti-6Al-4V 合金表面生成的钝化膜。
关键词: Ta-N涂层; Ti-6Al-4V合金; 电化学腐蚀; 钝化膜; 半导体特性
徐江 , 鲍习科 , 蒋书运 . 纳米晶Ta2N涂层在模拟人体环境中的耐蚀性能研究[J]. 金属学报, 2018 , 54(3) : 443 -456 . DOI: 10.11900/0412.1961.2017.00246
Due to its combination of outstanding characteristics, such as superior biocompatibility, excellent mechanical properties as well as good corrosion resistance, Ti-6Al-4V alloy has gained much attention as one of the most popular load-bearing biomedical metals in the area of orthopedic and dental. Unfortunately, Ti-6Al-4V alloy suffers from the localized corrosion damage in human body ?uids containing high chloride ion concentrations, which leads to the release of metal ions into the human body. The released ions (e.g., Al and V) are found to not only cause allergic and toxic reactions but also exhibit potential negative effects on osteoblast behavior. To improve the corrosion resistance of Ti-6Al-4V alloy in simulated body ?uids, a 40 μm thick Ta2N nanocrystalline coating with an average grain size of 12.8 nm was engineered onto a Ti-6Al-4V substrate using a double cathode glow discharge technique. The hardness and elastic modulus of the Ta2N coating were determined to be (32.1±1.6) GPa and (294.8±4.2) GPa, respectively, and the adhesion strength of the coating deposited on Ti-6Al-4V substrate was found to be 56 N. There is no evidence of crack formation within the coating under loads ranging from 0.49 N to 9.8 N, implying that the Ta2N nanocrystalline coating has a high contact damage resistance. Moreover, the corrosion resistance of the Ta2N nanocrystalline coating is significantly greater than that of Ti-6Al-4V alloy when tested in naturally aerated Ringer's solution at 37 ℃. This is due to that the passive film developed on the coating has superior compactness compared with that formed on the uncoated Ti-6Al-4V alloy. XPS analysis indicated that at a low polarized potential, the passive film consisted of TaOxNy, which would be converted to Ta2O5 at a higher polarized potential. The analysis of Mott-Schottky curves suggested that the passive film formed on the coating exhibits n-type semiconductor properties and, as such, the density and diffusivity of carrier for the coating was considerably lower than that for the uncoated Ti-6Al-4V alloy.
| [1] | Geetha M, Singh A K, Asokamani R, et al.Ti based biomaterials, the ultimate choice for orthopaedic implants—A review[J]. Prog. Mater. Sci., 2009, 54: 397 |
| [2] | Zaffe D, Bertoldi C, Consolo U.Element release from titanium devices used in oral and maxillofacial surgery[J]. Biomaterials, 2003, 24: 1093 |
| [3] | Matusiewicz H.Potential release of in vivo trace metals from metallic medical implants in the human body: From ions to nanoparticles—A systematic analytical review[J]. Acta Biomater., 2014, 10: 2379 |
| [4] | Rahilly G, Price N.Current products and practice nickel allergy and orthodontics[J]. J. Orthod., 2003, 30: 171 |
| [5] | Kumazawa R, Watari F, Takashi N, et al.Effects of Ti ions and particles on neutrophil function and morphology[J]. Biomaterials, 2002, 23: 3757 |
| [6] | Souto R M, Laz M M, Reis R L.Degradation characteristics of hydroxyapatite coatings on orthopaedic TiAlV in simulated physiological media investigated by electrochemical impedance spectroscopy[J]. Biomaterials, 2003, 24: 4213 |
| [7] | Leit?o E, Sa C, Silva R A, et al.Electrochemical and surface modifications on N+-ion implanted Ti-6Al-4V immersed in HBSS[J]. Corros. Sci., 1995, 37: 1861 |
| [8] | Jiang P L, Lin L X, Zhang F, et al.Electrochemical construction of micro-nano spongelike structure on titanium substrate for enhancing corrosion resistance and bioactivity[J]. Electrochim. Acta, 2013, 107: 16 |
| [9] | Liu G H, Wang J, Yang S H, et al.Effect of a porous tantalum rod on early and intermediate stages of necrosis of the femoral head[J]. Biomed. Mater., 2010, 5: 065003 |
| [10] | Zitter H, Plenk H Jr.The electrochemical behavior of metallic implant materials as an indicator of their biocompatibility[J]. Biomed. J. Mater. Res, 1987, 21: 881 |
| [11] | Leng Y X, Sun H, Yang P, et al. Biomedical properties of tantalum nitride films synthesized by reactive magnetron sputtering [J]. Thin. Solid Films, 2001, 398-399: 471 |
| [12] | Kokubo T, Takadama H.How useful is SBF in predicting in vivo bone bioactivity[J]. Biomaterials, 2006, 27: 2907 |
| [13] | Zhang Y M, Chai F, Hornez J C, et al.The corrosion and biological behaviour of titanium alloys in the presence of human lymphoid cells and MC3T3-E1 osteoblasts[J]. Biomed. Mater, 2009, 4: 015004 |
| [14] | Lei W W, Liu D, Zhang J, et al.Direct synthesis and characterization of single-phase tantalum nitride (Ta2N) nanocrystallites by dc arc discharge[J]. J. Alloys Compd., 2008, 459: 298 |
| [15] | Cheng H, Hon M.Texture formation in titanium nitride films prepared by chemical vapor deposition[J]. J. Appl. Phys., 1996, 79: 8047 |
| [16] | Xu J, Li Z Y, Xu S, et al.A nanocrystalline zirconium carbide coating as a functional corrosion-resistant barrier for polymer electrolyte membrane fuel cell application[J]. J. Power Sources, 2015, 297: 359 |
| [17] | Musil J, Jirout M.Toughness of hard nanostructured ceramic thin films[J]. Surf. Coat. Technol., 2007, 201: 5148 |
| [18] | Hogmark S, Jacobson S, Larsson M.Design and evaluation of tribological coatings[J]. Wear, 2000, 246: 20 |
| [19] | Kannan A R S, Muralidharan S, Sarangapani K B, et al. Corrosion and anodic behaviour of zinc and its ternary alloys in alkaline battery electrolytes[J]. J. Power Sources, 1995, 57: 93 |
| [20] | Sun S, Podlaha E J.Electrodeposition of Mo-rich, MoNi alloys from an aqueous electrolyte[J]. J. Electrochem. Soc., 2012, 159: D97 |
| [21] | Alves V A, Reis R Q, Santos I C B, et al. In situ impedance spectroscopy study of the electrochemical corrosion of Ti and Ti-6Al-4V in simulated body fluid at 25 ℃ and 37 ℃[J]. Corros. Sci., 2009, 51: 2473 |
| [22] | Jiang Z L, Dai X, Middleton H.Effect of silicon on corrosion resistance of Ti-Si alloys[J]. Mater. Sci. Eng., 2011, B176: 79 |
| [23] | Vasilescu C, Drob S I, Moreno J M C, et al. Long-term corrosion resistance of new Ti-Ta-Zr alloy in simulated physiological fluids by electrochemical and surface analysis methods[J]. Corros. Sci., 2015, 93: 310. |
| [24] | Macdonald D D, Urquidi-Macdonald M.Theory of steady-state passive films[J]. J. Electrochem. Soc., 1990, 137: 2395 |
| [25] | Chang C C, Jeng J S, Chen J S.Microsteuctural and electrical characteristics of reactively sputtered Ta-N thin films[J]. Thin Solid Films, 2002, 413: 46 |
| [26] | Lamour P, Fioux P, Ponche A, et al.Direct measurement of the nitrogen content by XPS in self-passivated TaNx thin films[J]. Surf. Interface Anal., 2008, 40: 1430 |
| [27] | Olefjord I, Wegrelius L.The influence of nitrogen on the passivation of stainless steels[J]. Corros. Sci., 1996, 38: 1203 |
| [28] | Feng Z C, Cheng X Q, Dong C F, et al.Passivity of 316L stainless steel in borate buffer solution studied by Mott-Schottky analysis, atomic absorption spectrometry and X-ray photoelectron spectroscopy[J]. Corros. Sci., 2010, 52: 3646 |
| [29] | Jovic V D, Barsoum M W.Corrosion behavior and passive film characteristics formed on Ti, Ti3SiC2, and Ti4AlN3 in H2SO4 and HCl[J]. J. Electrochem. Soc., 2004, 151: B71 |
| [30] | Kerrec O, Devilliers D, Grout H, et al.Dielectric properties of anodic oxide films on tantalum[J]. Electrochim. Acta, 1995, 40: 719 |
| [31] | Silva R A, Walls M, Rondot B, et al.Electrochemical and microstructural studies of tantalum and its oxide films for biomedical applications in endovascular surgery[J]. J. Mater. Sci. Mater. Med., 2002, 13: 495 |
| [32] | Schneider M, Schroth S, Schilm J, et al.Micro-EIS of anodic oxide films on titanium for capacitor applications[J]. Electrochim. Acta, 2009, 54: 2663 |
| [33] | Macdonald D D.The point defect model for the passive state[J]. J. Electrochem. Soc., 1992, 139: 3434 |
| [34] | Kong D S, Lu W H, Feng Y Y, et al.Studying on the point-defect-conductive property of the semiconducting anodic films on titanium[J]. J. Electrochem. Soc., 2009, 156: C39 |
| [35] | Guo H X, Lu B T, Luo J T.Study on passivation and erosion-enhanced corrosion resistance by Mott-Schottky analysis[J]. Electrochim. Acta, 2006, 52: 1108 |
| [36] | Mandonald D D.The history of the point defect model for the passive state: A brief review of film growth aspects[J]. Electrochim. Acta, 2011, 56: 1761 |
| [37] | Ye W, Li Y, Wang F H.Effects of nanocrystallization on the corrosion behavior of 309 stainless steel[J]. Electrochim. Acta, 2006, 51: 4426 |
/
| 〈 |
|
〉 |