多孔结构MgO表面化学镀Ni层的制备与表征

李均明; 蒋百灵; 蔡辉; 薛晓楠

doi:10.3724/SP.J.1037.2010.00055

金属学报 >

2010 , Vol. 46 >Issue 9: 1103 - 1108

DOI: https://doi.org/10.3724/SP.J.1037.2010.00055

论文

多孔结构MgO表面化学镀Ni层的制备与表征

李均明 ,
蒋百灵 ,
蔡辉 ,
薛晓楠

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1) 西安理工大学材料科学与工程学院, 西安 710048
2) 西安交通大学理学院物质非平衡合成与调控教育部重点实验室, 西安 710049

李均明, 男, 1972年生, 副教授

收稿日期: 2010-01-28

修回日期: 2010-06-02

网络出版日期: 2010-09-11

基金资助

国家重大国际合作研究项目2007DFB50150和陕西省重点学科专项资金建设项目资助

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PREPARATION AND CHARACTERIZATION OF ELECTROLESS Ni COATING ON THE SURFACE OF MgO WITH POROUS STRUCTURE

LI Jun-Meng ,
JIANG Bai-Ling ,
SA Hui ,
XUE Xiao-Nan

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1) School of Materials Science and Engineering, Xi'an University of Technology, Xi'an 710048
2) MOE Key Laboratory for Nonequilibrium Synthesis and Modulation of Condensed Matter, School of Science, Xi'an Jiaotong University, Xi'an 710049

Received date: 2010-01-28

Revised date: 2010-06-02

Online published: 2010-09-11

Supported by

Supported by Major International Joint Research Program of China (No.2007DFB50150) and Shaanxi Provincial Project of Special Foundation of Key Disciplines

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摘要

利用多孔结构的表面活性, 采用以硫酸镍(NiSO₄?7H₂O)为主盐, 次亚磷酸钠(NaH₂PO₂?H₂O)为还原剂且无其它特殊组分的常用化学镀Ni溶液, 经无敏化活化预处理直接在微弧氧化形成的多孔MgO薄膜表面制备出化学镀Ni层, 并对Ni层的相组成、显微结构、导电性和耐蚀性进行了表征. 结果表明: 平均厚度约5 μm的化学镀Ni层颗粒均匀, 组织致密; Ni层进入MgO薄膜的孔洞, 形成交错咬合状态. XRD分析表明, Ni层由晶态Ni与非晶态Ni--P组成. 四探针和极化曲线测试结果说明 Ni层的导电性良好, 同时由于Ni层的存在, 试样的腐蚀电位显著提高. 化学镀Ni过程中, 溶液中的Ni²⁺在还原剂离子的作用下首先在多孔MgO薄膜的微孔处还原沉积生成微小的初生Ni颗粒, 初生Ni颗粒进而长大并扩展, 最终形成完整的化学镀Ni层. 多孔结构以其特有的活化作用实现了氧化物表面无敏化活化预处理的化学镀.

关键词： 化学镀Ni; MgO; 多孔结构; 导电性; 腐蚀电位

本文引用格式

李均明 , 蒋百灵 , 蔡辉 , 薛晓楠 . 多孔结构MgO表面化学镀Ni层的制备与表征[J]. 金属学报, 2010 , 46(9) : 1103 -1108 . DOI: 10.3724/SP.J.1037.2010.00055

Abstract

Generally, the surface pretreatments such as sensitization and activation are necessary for depositing a nickel metal layer on oxide surface by electroless plating, however, for an oxide surface with porous structure it is possible that the pretreatment is not necessary. In this paper, only by use of the surface activity of porous structure, an electroless plated nickel layer can be prepared on the surface of microarc-oxidation-fabricated porous magnesium oxide film in a conventional electroless nickel plating solution, consisted of nickel sulfate as main salt and sodium hypophosphite as reducing agent. Furthermore, the phase, microstructure, electrical conductivity and corrosion resistance of the obtained nickel layer were characterized. The results indicate that the 5 μm-thick nickel layer is composed of fine and homogeneously distributed nickel particles, at the same time the microstructure of nickel layer is dense. Nickel layer spreads into the micropores on the surface of porous magnesium oxide film, so that an interleaving interface is formed at nickel/oxide interface. XRD results reveal that the nickel layer contains crystalline Ni and amorphous Ni-P. Four-point probe measurement indicates that the nickel layer exhibits well electrical conductivity. Meanwhile, polarization curve reveals that corrosion potential elevates notably due to the presence of nickel layer. During electroless nickel plating the nickel ions in solution were reduced and deposited in the micropores of porous magnesium oxide film under the action of reducing agent ions, so as to generate tiny primary nickel particles, subsequently, these primary nickel particles continuously grew and spread, and finally formed an entire nickel layer on oxide surface.

Key words： electroless nickel plating; MgO; porous structure; electrical conductivity; corrosion potential

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