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金属学报  1983, Vol. 19 Issue (6): 100-103    
  论文 本期目录 | 过刊浏览 |
低温电解渗硫层及其形成机理的XPS研究
王当憨;伍岩
中国科学院化学研究所;哈尔滨工业大学
A STUDY OF THE SURFACE TREATED WITH SULF BT BY XPS
WANG Tanghan (Institute of Chemistry; Academia Sinica; Beijing); WU Yan (Harbin Institute of Technology)
引用本文:

王当憨;伍岩. 低温电解渗硫层及其形成机理的XPS研究[J]. 金属学报, 1983, 19(6): 100-103.
, . A STUDY OF THE SURFACE TREATED WITH SULF BT BY XPS[J]. Acta Metall Sin, 1983, 19(6): 100-103.

全文: PDF(328 KB)  
摘要: 本文的XPS(X射线光电子能谱)结果揭示了,渗硫层中的主要成分并非为人们通常认为的仅是FeS(?)一种,而是FeS和FeSO_3两种,并且二者的相对含量基本相等。
Abstract:The main component in the surface treated with SULF BT has been recognized to be a category of iron sulphide (FeS) so far, however, the XPS results in the present paper show that the surface contains not only iron sulphide (FeS), but also iron sulphite (FeSO_3), and both relative amounts in the surface are the same.
收稿日期: 1983-06-18     
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