金属学报  1984, Vol. 20 Issue (1): 111-116

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离子注入金属表层的椭圆仪分析

隋森芳;陈鹤鸣

清华大学;清华大学

ELLIPSOMETRIC ANALYSIS OF ION-IMPLANTED SURFACE LAYER ON METAL

SUI Senfang; CHEN Heming (Qinghua University; Beijing)(Manuscript received 5 February; 1982; revised manuscript 22 July; 1983)

隋森芳;陈鹤鸣. 离子注入金属表层的椭圆仪分析[J]. 金属学报, 1984, 20(1): 111-116.
, . ELLIPSOMETRIC ANALYSIS OF ION-IMPLANTED SURFACE LAYER ON METAL[J]. Acta Metall Sin, 1984, 20(1): 111-116.

摘要 参考文献 相关文章 Metrics 全文: PDF(707 KB)   摘要: 本文探讨了激光椭圆仪对离子注入金属表层的分析方法。实验结果表明,赝介电虚(?)值的变化可以提供金属表层由晶态到非晶态转变的信息。 Abstract：An ellipsometric method is prcscnted for the analysis of the ion-implanted surface layer on metal. Experimental results indicate that the variation of the pseudo-imaginary part of the dielectric function can give the information about the transformation from the crystalline into amorphous state of the surface layer on rectal by ion implantation. 收稿日期: 1984-01-18      服务 把本文推荐给朋友 加入引用管理器 E-mail Alert RSS 作者相关文章 隋森芳 陈鹤鸣 44.8K 链接本文: https://www.ams.org.cn/CN/      或      https://www.ams.org.cn/CN/Y1984/V20/I1/111 1 Adams, J.R.; Bashara, N.M., Surf. Sci., 49 (1975) , 441． 2 Schroeder, J.B.; Dieselman, H.D., J. Appl. Phys., 40 (1969) , 2559． 3 莫党;卢因诚;李旦晖;刘尚礼;卢武星,半导体学报,1(1980) ,198． 4 Cullis, A.G.; Poate, J.M., Appl. Phys. Lett., 28 (1976) , 314． 5 Grant, W.A., J. Vac. Sci. Technol., 15 (1978) , 1644． 6 隋森芳;吴秉芬;陈清明;陈鹤鸣,物理,11(1982) ,273． 7 半导体教研室表面钝化科研小组,西安交通大学学报,2(1974) ,No.3,17． 8 Vedam, K., Surf. Sci., 56 (1976) , 221 No related articles found! Viewed Full text Abstract Cited   Shared      Discussed