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双脉冲HiPIMS放电特性及CrN薄膜高速率沉积 |
吴厚朴,田修波(),张新宇,巩春志 |
哈尔滨工业大学先进焊接与连接国家重点实验室 哈尔滨 150001 |
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Discharge Characteristics of Novel Dual-Pulse HiPIMS and Deposition of CrN Films with High Deposition Rate |
Houpu WU,Xiubo TIAN(),Xinyu ZHANG,Chunzhi GONG |
State Key Laboratory of Advanced Welding Production and Technology, Harbin Institute of Technology, Harbin 150001, China |
引用本文:
吴厚朴,田修波,张新宇,巩春志. 双脉冲HiPIMS放电特性及CrN薄膜高速率沉积[J]. 金属学报, 2019, 55(3): 299-307.
Houpu WU,
Xiubo TIAN,
Xinyu ZHANG,
Chunzhi GONG.
Discharge Characteristics of Novel Dual-Pulse HiPIMS and Deposition of CrN Films with High Deposition Rate[J]. Acta Metall Sin, 2019, 55(3): 299-307.
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